公开(公告)号：US20170184960A1

公开(公告)日：2017-06-29

申请号：US15460503

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  H01L21/027 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

Abstract: A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20180017864A9

公开(公告)日：2018-01-18

申请号：US15460503

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  H01L21/027 ,  G03F7/32

Abstract: A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.