公开(公告)号：US20190227432A1

公开(公告)日：2019-07-25

申请号：US16287228

申请日：2019-02-27

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

Abstract: A radiation-sensitive composition contains: particles that include a metal oxide, a cation that includes a metal, an anion. The anion is preferably a conjugated base of an acid and the acid has preferably a pKa of no greater than 3. The content of the particles in terms of solid content equivalent is preferably no less than 50% by mass, and more preferably no less than 70% by mass. The hydrodynamic radius of the particles as determined by a dynamic light scattering analysis is preferably no greater than 10 nm. The total content of the cation and the anion with respect to 100 parts by mass of the particles is preferably no less than 5 parts by mass. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof.

公开(公告)号：US20230203229A1

公开(公告)日：2023-06-29

申请号：US18108108

申请日：2023-02-10

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Motohiro SHIRATANI ,  Hiroyuki KOMATSU ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: C08F297/02 ,  G03F7/00 ,  G03F7/075

CPC classification number: C08F297/026 ,  G03F7/0035 ,  G03F7/0757 ,  C08F2810/40

Abstract: A composition includes a polymer (1) having a partial structure represented by formula (1), and a solvent. X is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1 to 5 carbon atoms, a hydroxyalkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms. Y is a monovalent organic group having 1 to 12 carbon atoms and containing a hetero atom or a monovalent inorganic acid group. Z is a linking group represented by —O—, —S—, or —NR—, where R is an organic group having 1 to 20 carbon atoms. R1 and R2 are each independently a hydrogen atom, a halogen atom, or an organic group having 1 to 20 carbon atoms, or the like.

公开(公告)号：US20200004144A1

公开(公告)日：2020-01-02

申请号：US16569920

申请日：2019-09-13

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Shinya MINEGISHI ,  Motohiro SHIRATANI

IPC: G03F7/004 ,  G03F7/32 ,  G03F7/20

Abstract: A radiation-sensitive composition contains: a compound that includes a metal and an oxygen atom, the metal and the oxygen atom being bonded by a covalent bond; and a solvent composition. The metal is a metal of an element belonging to any one of period 4 to period 7 of group 3 to group 15 in periodic table. The solvent contains: a first solvent having a viscosity at 20° C. of no greater than 10 mPa·s and a vapor pressure at 20° C. of no greater than 5 kPa; and a second solvent having a van der Waals volume of no greater than 150 Å3, and being different from the first solvent. The second solvent is: water; a monovalent alcohol represented by R1—OH; R2—COOH; or a combination thereof.

公开(公告)号：US20170299962A1

公开(公告)日：2017-10-19

申请号：US15642908

申请日：2017-07-06

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Takehiko NARUOKA ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32

CPC classification number: G03F7/0045 ,  G03F7/004 ,  G03F7/0043 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/322

Abstract: A radiation-sensitive composition includes an organic acid, particles including a metal oxide as a principal component, and an acid generating agent that is capable of generating an acid upon irradiation with a radioactive ray. A pKa, which is a logarithmic value of a reciprocal of an acid dissociation constant Ka, of the acid generated from the acid generating agent is less than a pKa of the organic acid. The acid generating agent satisfies at least one of conditions (i) and (ii): (i) a van der Waals volume of the acid is no less than 2.1×10−28 m3; and (ii) the acid generating agent includes a plurality of groups that are capable of generating an acid.

公开(公告)号：US20170184960A1

公开(公告)日：2017-06-29

申请号：US15460503

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  H01L21/027 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

Abstract: A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20250164883A1

公开(公告)日：2025-05-22

申请号：US18951824

申请日：2024-11-19

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Fumiko YONEZAWA ,  Takehiro NAKAYAMA ,  Masahiro ARAKI ,  Hirofumi SASAKI

IPC: G03F7/039 ,  C08L25/18 ,  C08L33/06 ,  C08L33/16 ,  G03F7/00 ,  G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive composition includes: a first polymer comprising a structural unit (I) having an acid-dissociable group; a second polymer comprising a structural unit (i) represented by formula (f1); and a solvent. The acid-dissociable group has an iodo group. RK1 is a hydrogen atom, a fluorine atom, or the like; LY1 is a divalent hydrocarbon group having 1 to 10 carbon atoms; LY2 is —COO—* or —OCO—*, *is a bond on an Rf1 side; Rf1 is a monovalent hydrocarbon group having 1 to 10 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; Rf2 and Rf3 are each independently a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 3, and when Rf1 is the monovalent hydrocarbon group having 1 to 10 carbon atoms, s is an integer of 1 to 3.

公开(公告)号：US20220089809A1

公开(公告)日：2022-03-24

申请号：US17541317

申请日：2021-12-03

Applicant: JSR CORPORATION

Inventor： Hiroyuki KOMATSU ,  Motohiro SHIRATANI ,  Tatsuya SAKAI

IPC: C08G61/02 ,  C09D165/00 ,  B05D3/02

Abstract: A composition includes a polymer and a solvent. The polymer includes: a structural unit including a ring structure; and a functional group capable of bonding to a metal atom. An atom chain constituting the ring structure constitutes a part of a main chain of the polymer. The polymer preferably includes at an end of the main chain or at an end of a side chain, a group including the functional group. The functional group is preferably a cyano group, a phosphono group, or a dihydroxyboryl group. The ring structure preferably includes an alicyclic structure.

公开(公告)号：US20180017864A9

公开(公告)日：2018-01-18

申请号：US15460503

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  H01L21/027 ,  G03F7/32

Abstract: A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20170184961A1

公开(公告)日：2017-06-29

申请号：US15460477

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Takehiko NARUOKA ,  Motohiro SHIRATANI

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32

Abstract: A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R1 represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents —COOH. In a case where n is 2 to 4, X represents —OH, —COOH, —NCO, —NHRa, —COORA or —CO—C(RL)2—CO—RA. R1X)n  (1)

公开(公告)号：US20230259032A1

公开(公告)日：2023-08-17

申请号：US18138873

申请日：2023-04-25

Applicant: JSR CORPORATION

Inventor： Miki TAMADA ,  Ryo KUMEGAWA ,  Hiroyuki KOMATSU ,  Motohiro SHIRATANI ,  Ken MARUYAMA ,  Sosuke OSAWA

IPC: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12

CPC classification number: G03F7/11 ,  C08F112/08 ,  C08F120/14 ,  C09D125/06 ,  C09D133/12 ,  C08F2810/40

Abstract: A composition includes: at least one polymer represented by formula (1), formula (2), or both; and a solvent. A1 and A2 are each independently a structural unit having 2 or more carbon atoms; a plurality of A's are the same or different and a plurality of A2s are the same or different; n1 and n2 are each independently an integer of 2 to 500; R1, R2, and R3 are each independently an organic group having 1 or more carbon atoms, or R1 and R2 taken together represent a ring together with X1, Y1, and P; R1 and R2 are the same or different; X1, Y1, and Y2 are each independently a single bond, —O—, or —NR4—; R4 is an organic group having 1 or more carbon atoms; and Z1 and Z2 are each independently hydrogen or an organic group having 1 to 15 carbon atoms.