公开(公告)号：US20200004144A1

公开(公告)日：2020-01-02

申请号：US16569920

申请日：2019-09-13

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Shinya MINEGISHI ,  Motohiro SHIRATANI

IPC: G03F7/004 ,  G03F7/32 ,  G03F7/20

Abstract: A radiation-sensitive composition contains: a compound that includes a metal and an oxygen atom, the metal and the oxygen atom being bonded by a covalent bond; and a solvent composition. The metal is a metal of an element belonging to any one of period 4 to period 7 of group 3 to group 15 in periodic table. The solvent contains: a first solvent having a viscosity at 20° C. of no greater than 10 mPa·s and a vapor pressure at 20° C. of no greater than 5 kPa; and a second solvent having a van der Waals volume of no greater than 150 Å3, and being different from the first solvent. The second solvent is: water; a monovalent alcohol represented by R1—OH; R2—COOH; or a combination thereof.

公开(公告)号：US20170299962A1

公开(公告)日：2017-10-19

申请号：US15642908

申请日：2017-07-06

Applicant: JSR CORPORATION

Inventor： Motohiro SHIRATANI ,  Takehiko NARUOKA ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32

CPC classification number: G03F7/0045 ,  G03F7/004 ,  G03F7/0043 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/322

Abstract: A radiation-sensitive composition includes an organic acid, particles including a metal oxide as a principal component, and an acid generating agent that is capable of generating an acid upon irradiation with a radioactive ray. A pKa, which is a logarithmic value of a reciprocal of an acid dissociation constant Ka, of the acid generated from the acid generating agent is less than a pKa of the organic acid. The acid generating agent satisfies at least one of conditions (i) and (ii): (i) a van der Waals volume of the acid is no less than 2.1×10−28 m3; and (ii) the acid generating agent includes a plurality of groups that are capable of generating an acid.

公开(公告)号：US20170184960A1

公开(公告)日：2017-06-29

申请号：US15460503

申请日：2017-03-16

Applicant: JSR CORPORATION

Inventor： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  H01L21/027 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

Abstract: A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20190354010A1

公开(公告)日：2019-11-21

申请号：US16519420

申请日：2019-07-23

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC: G03F7/004 ,  G03F7/32 ,  G03F7/30 ,  G03F7/031

Abstract: A radiation-sensitive composition contains: a metal oxide having a first structural unit represented by formula (1), formula (2) or a combination thereof, and a second structural unit represented by formula (3); and a solvent. In the formulae (1) to (3), M1, M2 and M3 each independently represent germanium, tin or lead; and R1, R2 and R3 each independently represent a monovalent organic group having 1 to 40 carbon atoms which bonds to M1 or M2 via a carbon atom. A proportion of the first structural unit with respect to total structural units constituting the metal oxide is preferably no less than 50 mol %.

公开(公告)号：US20170269476A1

公开(公告)日：2017-09-21

申请号：US15611039

申请日：2017-06-01

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Motohiro SHIRATANI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  C08F212/14 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  C08F220/18 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C08F212/14 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0047 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: A photoresist composition includes a radiation-sensitive acid generator, particles, and a first solvent. The radiation-sensitive acid generator is capable of generating an acid upon irradiation with a radioactive ray, an action of the acid allowing a solubility of a film made from the photoresist composition in a developer solution to be altered. The particles include a metal element and have a hydrodynamic radius as determined by a dynamic light scattering analysis of no greater than 20 nm. The photoresist composition may include an acid-labile compound including an acid-labile group. The radiation-sensitive acid generator may be the acid-labile compound including a group that is capable of generating an acid upon exposure to a radioactive ray.

公开(公告)号：US20170059992A1

公开(公告)日：2017-03-02

申请号：US15239136

申请日：2016-08-17

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Takehiko Naruoka ,  Tomoki Nagai

IPC: G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/038

CPC classification number: G03F7/203 ,  G03F7/0392 ,  G03F7/325

Abstract: A resist pattern-forming method comprises applying a chemically amplified radiation-sensitive resin composition on a substrate to form a resist film. The chemically amplified radiation-sensitive resin composition comprises a first component solubility in a developer solution of which is capable of being altered by an action of an acid, a second component that is capable of generating an acid by an action of a first exposure light comprising a radioactive ray having a first wavelength, and a sensitizer precursor to be converted into a sensitizer by an action of the first exposure light. A first exposure of the resist film to the first exposure light is conducted. A second exposure of the resist film exposed to the first exposure light, to a second exposure light is conducted. The second exposure light comprises a radioactive ray having a second wavelength longer than the first wavelength.

Abstract translation: 抗蚀剂图案形成方法包括将化学放大的辐射敏感性树脂组合物施加在基材上以形成抗蚀剂膜。 化学放大的辐射敏感性树脂组合物包含第一组分在其显影剂溶液中的溶解度，其能够通过酸的作用而改变，第二组分可以通过第一曝光的作用产生酸， 具有第一波长的放射线和通过第一曝光光的作用转变成敏化剂的敏化剂前体。 进行抗蚀剂膜与第一曝光光的第一次曝光。 进行暴露于第一曝光光的抗蚀剂膜到第二曝光光的第二次曝光。 第二曝光光包括具有比第一波长长的第二波长的放射线。

公开(公告)号：US20200166840A1

公开(公告)日：2020-05-28

申请号：US16778166

申请日：2020-01-31

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Yusuke Asano ,  Shinya Minegishi

IPC: G03F7/038 ,  G03F7/004 ,  C08G79/00 ,  C08G79/12 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/30

Abstract: A radiation-sensitive composition contains: a polymetalloxane including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. In the following formula (1), M represents a germanium atom, a tin atom or a lead atom; Ar1 represents a substituted or unsubstituted aryl group having 6 to 20 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 20 ring atoms; R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydrogen atom, a halogen atom or a hydroxy group; and n is 2 or 3.

公开(公告)号：US20160349616A1

公开(公告)日：2016-12-01

申请号：US15235471

申请日：2016-08-12

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Ryuichi Saitou ,  Shunsuke Kurita ,  Tatsuya Sakai

IPC: G03F7/11 ,  H01L21/033 ,  G03F7/09

CPC classification number: G03F7/11 ,  G03F7/091 ,  G03F7/094 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/31144

Abstract: A semiconductor device production composition comprises a product obtained by mixing a metal compound and a compound represented by Formula (1) in a first organic solvent, and a second organic solvent. R and R′ each independently represent a hydrogen atom, a linear or cyclic alkyl group having a carbon number of 2 to 20, a linear or cyclic alkylcarbonyl group having a carbon number of 2 to 20, an aryl group having a carbon number of 6 to 20, or an aryloxy group having a carbon number of 6 to 20, and part of the hydrogen atoms in the cyclic alkyl, cyclic alkylcarbonyl, aryl, or aryloxy group are substituted or unsubstituted. R—O—O—R′  (1)

公开(公告)号：US20200041898A1

公开(公告)日：2020-02-06

申请号：US16595884

申请日：2019-10-08

Applicant: JSR CORPORATION

Inventor： Hisashi NAKAGAWA ,  Yusuke ASANO ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/20

Abstract: A radiation-sensitive composition includes particles and a solvent. The particles include a first component and a second component. The first component is a hydrolyzation product or a hydrolytic condensation product of a metal compound including a hydrolyzable group, or a combination thereof; and the second component is an organic acid, an anion of the organic acid, a first compound represented by formula (1), or a combination thereof. The organic acid and the first compound each have a molecular weight of no less than 120. In the formula (1), R1 represents an organic group having a valency of n; X represents an alcoholic hydroxyl group, —NCO or —NHRa, wherein Ra represents a hydrogen atom or a monovalent organic group; and n is an integer of 2 to 4.

公开(公告)号：US20190310551A1

公开(公告)日：2019-10-10

申请号：US16449720

申请日：2019-06-24

Applicant: JSR CORPORATION

Inventor： Shinya MINEGISHI ,  Motohiro SHIRATANI ,  Yusuke ASANO ,  Hisashi NAKAGAWA ,  Takehiko NARUOKA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/32

Abstract: Provided is a radiation-sensitive composition superior in sensitivity. A radiation-sensitive composition incudes a metal oxide having a structural unit represented by formula (1), and a solvent. In the formula (1), M represents germanium, tin or lead; R1 represents a monovalent organic group having no greater than 30 carbon atoms which includes at least one of an electron attractive group and an unsaturated bond-containing group, and bonds to M via a carbon atom.