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1.发明申请公开(公告)号：US20220005505A1
公开(公告)日：2022-01-06
申请号：US17475481
申请日：2021-09-15
摘要： A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
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公开(公告)号：US11821076B2
公开(公告)日：2023-11-21
申请号：US16470588
申请日：2018-09-11
CPC分类号： C23C14/3414 , C22C19/07 , C23C14/086 , H01J37/3426
摘要： Provided is a sputtering target that can form a magnetic film having both good magnetic separation between magnetic grains and high coercive force at the same time; a magnetic film; and a method for producing a magnetic film.
The sputtering target according to the present invention comprises: 1 at. % or more of Zn, a part or all of Zn forming a complex oxide(s) of Zn—Ti—O and/or Zn—Si—O; and 45 at. % or less of Pt, the balance being Co and inevitable impurities, the atomic percentage being based on an atomic ratio.-
公开(公告)号：US20210172055A1
公开(公告)日：2021-06-10
申请号：US16470588
申请日：2018-09-11
摘要： Provided is a sputtering target that can form a magnetic film having both good magnetic separation between magnetic grains and high coercive force at the same time; a magnetic film; and a method for producing a magnetic film.
The sputtering target according to the present invention comprises: 1 at. % or more of Zn, a part or all of Zn forming a complex oxide(s) of Zn—Ti—O and/or Zn—Si—O; and 45 at. % or less of Pt, the balance being Co and inevitable impurities, the atomic percentage being based on an atomic ratio.-
4.发明申请公开(公告)号：US20210172050A1
公开(公告)日：2021-06-10
申请号：US16468769
申请日：2018-08-16
摘要： A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
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公开(公告)号：US20230227964A1
公开(公告)日：2023-07-20
申请号：US18177244
申请日：2023-03-02
IPC分类号： C23C14/34 , C22C19/07 , G11B5/706 , H01F1/10 , H01F41/18 , G11B5/65 , C04B35/01 , C23C14/08 , C23C14/14 , H01J37/34
CPC分类号： C23C14/3414 , C22C19/07 , G11B5/70605 , H01F1/10 , H01F41/18 , G11B5/658 , C04B35/01 , C23C14/08 , C23C14/14 , H01J37/3426 , C22C32/00
摘要： Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
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公开(公告)号：US20230019656A1
公开(公告)日：2023-01-19
申请号：US17951234
申请日：2022-09-23
摘要： A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
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7.发明申请公开(公告)号：US20200051589A1
公开(公告)日：2020-02-13
申请号：US16344372
申请日：2018-08-16
摘要： A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
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公开(公告)号：US11618944B2
公开(公告)日：2023-04-04
申请号：US17266896
申请日：2019-05-23
IPC分类号： H01J37/34 , C23C14/34 , C22C19/07 , G11B5/706 , H01F1/10 , H01F41/18 , G11B5/65 , C04B35/01 , C23C14/08 , C23C14/14 , C22C32/00 , C22C1/04
摘要： Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
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公开(公告)号：US11591688B2
公开(公告)日：2023-02-28
申请号：US16973074
申请日：2019-05-23
摘要： Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.
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公开(公告)号：US20210310114A1
公开(公告)日：2021-10-07
申请号：US17266896
申请日：2019-05-23
摘要： Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
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