公开(公告)号：US20240287649A1

公开(公告)日：2024-08-29

申请号：US18519490

申请日：2023-11-27

Applicant: Oerlikon Surface Solutions AG, Pfaffikon ,  Plansee Composite Materials GmbH

Inventor： Peter POLCIK ,  Jurgen RAMM

IPC: C22C1/04 ,  B22F3/087 ,  B22F3/105 ,  B22F5/04 ,  B22F9/04 ,  B32B15/00 ,  B32B15/01 ,  C22C1/047 ,  C22C19/03 ,  C22C19/07 ,  C23C14/00 ,  C23C14/02 ,  C23C14/08 ,  C23C14/14 ,  C23C14/16 ,  C23C14/32 ,  C23C14/34 ,  C23C28/00 ,  C23C28/02 ,  C23C28/04 ,  C23C30/00 ,  F01D5/28 ,  F01D25/00

CPC classification number: C22C1/0433 ,  B22F3/087 ,  B22F3/105 ,  B22F5/04 ,  B22F9/04 ,  B32B15/00 ,  B32B15/01 ,  C22C1/0416 ,  C22C1/047 ,  C22C19/03 ,  C22C19/07 ,  C23C14/0021 ,  C23C14/0036 ,  C23C14/025 ,  C23C14/027 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/085 ,  C23C14/14 ,  C23C14/16 ,  C23C14/325 ,  C23C14/3414 ,  C23C28/02 ,  C23C28/022 ,  C23C28/028 ,  C23C28/048 ,  C23C28/30 ,  C23C28/321 ,  C23C28/325 ,  C23C28/345 ,  C23C28/36 ,  C23C30/00 ,  C23C30/005 ,  F01D5/28 ,  F01D5/284 ,  F01D5/288 ,  F01D25/005 ,  B22F2003/1051 ,  C22C1/0458 ,  C22C2200/00 ,  F05D2220/30 ,  F05D2220/32 ,  F05D2230/30 ,  F05D2230/90 ,  F05D2300/175 ,  F05D2300/21 ,  F05D2300/611 ,  Y10T428/12458 ,  Y10T428/1259 ,  Y10T428/12597 ,  Y10T428/12604 ,  Y10T428/12611 ,  Y10T428/12639 ,  Y10T428/12667 ,  Y10T428/12771

Abstract: A superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 μm, and the porosity in the structure is smaller than 10%. Furthermore, the invention includes a method of producing a superalloy target by powder metallurgical production, wherein the powder-metallurgical production starts from alloyed powder (s) of a superalloy and includes the step of spark plasma sintering (SPS) of the alloyed powder (s).

公开(公告)号：US20240232453A9

公开(公告)日：2024-07-11

申请号：US18492210

申请日：2023-10-23

Applicant: Honeywell Federal Manufacturing & Technologies, LLC

Inventor： Wesley Alexander Everhart ,  Joseph Newkirk

IPC: G06F30/17 ,  C21D1/74 ,  C21D6/00 ,  C22C1/03 ,  C22C19/07 ,  C22C33/06 ,  C22C38/10 ,  C22C38/12 ,  C22F1/02 ,  C22F1/10 ,  G06N5/022 ,  G16C60/00

CPC classification number: G06F30/17 ,  C21D1/74 ,  C21D6/007 ,  C22C1/03 ,  C22C19/07 ,  C22C33/06 ,  C22C38/10 ,  C22C38/12 ,  C22F1/02 ,  C22F1/10 ,  G06N5/022 ,  G16C60/00

Abstract: Methods of modeling metal alloys and forming those alloys are provided. The method involves comparing the strain accommodation and cleavage energies of a base alloy comprising a first metal and a chemical element different from the first metal. If a predetermined difference between those energies would be achieved, the base alloy will be sufficiently ductile. If that predetermined difference would not be achieved, the base alloy will not be sufficiently ductile, and the base alloy is modified (e.g., by adding a ductility component) until the predetermined difference in energies would be achieved, at which point, the alloy can be formed using conventional methods or further modified to achieve the desired degree of ductility.

公开(公告)号：US11965253B2

公开(公告)日：2024-04-23

申请号：US16980702

申请日：2019-03-15

Applicant: MANNESMANN PRECISION TUBES FRANCE

Inventor： Olivier Raccurt ,  Jean-Marie Gentzbittel ,  Olivier Sicardy ,  Francis Bourguignon ,  Pierre-Jean Marchais

IPC: C23C8/14 ,  C22C19/03 ,  C22C19/07 ,  C22C38/18 ,  C23C8/02 ,  C23C8/18 ,  C23C8/80 ,  F24S20/20 ,  F24S70/20

CPC classification number: C23C8/14 ,  C22C19/03 ,  C22C19/07 ,  C22C38/18 ,  C23C8/02 ,  C23C8/18 ,  C23C8/80 ,  F24S20/20 ,  F24S70/20

Abstract: A method for forming a layer of single-phase oxide (Fe, Cr)2O3 with a rhombohedral structure on a steel or super alloy substrate, may include, successively: (a) supplying a steel or super alloy substrate covered with a surface layer, the steel including at least 2 wt.-% chromium; (b) removing the surface layer in an atmosphere containing at least 0.2 atm O2, creating a level of micro-deformation in the crystal lattice of the steel or super alloy that is greater than 1.0.10−3, and a heating at a heating rate higher than 400° C./s, such as to form a layer of rhombohedral oxide (30) (Fe, Cr)2O3; and (c) carrying out a thermal treatment, in the presence of air, at a water partial pressure of less than 10.000 ppm, and at a temperature varying in a range of from 400 to 1000° C., such as to grow the layer of rhombohedral oxide formed in the removing (b) to a thickness in a range of from 70 to 150 nm.

公开(公告)号：US11945033B2

公开(公告)日：2024-04-02

申请号：US17709498

申请日：2022-03-31

Applicant: Vacuumschmelze GmbH & Co KG

Inventor： Kaan Üstüner ,  Matthias Katter ,  Christoph Brombacher ,  Daniela Benedikt

IPC: B22F7/08 ,  C22C19/07 ,  H01F1/055 ,  H01F41/02

CPC classification number: B22F7/08 ,  C22C19/07 ,  H01F1/055 ,  H01F41/0253 ,  B22F2201/00 ,  B22F2301/155 ,  C22C2202/02

Abstract: A method is provided for the heat treatment of an object comprising at least one rare-earth element with a high vapor pressure. One or more objects comprising at least one rare-earth element with a high vapor pressure are arranged in an interior of a package. An external source of the at least one rare-earth element is arranged so as to compensate for the evaporation of this same rare-earth element from the object and/or to increase the vapor pressure of the rare-earth element in the interior of the package, and the package is heat treated.

公开(公告)号：US20240071659A1

公开(公告)日：2024-02-29

申请号：US18455860

申请日：2023-08-25

Applicant: TDK CORPORATION

Inventor： Isao KANADA ,  Hiroshi ITO ,  Kyohei TAKAHASHI

IPC: H01F1/147 ,  B22F1/054 ,  B22F1/10 ,  B22F1/145 ,  B22F3/02 ,  C22C19/07

CPC classification number: H01F1/14733 ,  B22F1/054 ,  B22F1/10 ,  B22F1/147 ,  B22F3/02 ,  C22C19/07 ,  B22F2202/01 ,  B22F2301/15 ,  B22F2304/054 ,  B22F2998/10 ,  B22F2999/00 ,  C22C2202/02

Abstract: A metal magnetic powder includes: metal nanoparticles having an average particle size (D50) is 1 nm to 100 nm, and a main phase of hcp-Co; and an additive elements α including at least one of Fe, Ni, and Cu.

公开(公告)号：US20240011127A1

公开(公告)日：2024-01-11

申请号：US17862128

申请日：2022-07-11

Applicant: Liburdi Engineering Limited

Inventor： Alexander B. GONCHAROV ,  Paul LOWDEN

IPC: C22C19/05 ,  B23K9/167 ,  C22C19/07 ,  C22C27/02 ,  C22C21/00 ,  C22C16/00 ,  B23K35/30

CPC classification number: C22C19/056 ,  B23K9/167 ,  C22C19/07 ,  C22C27/02 ,  C22C21/00 ,  C22C16/00 ,  B23K35/304 ,  B33Y70/00

Abstract: High gamma prime nickel based welding materials comprising (all in wt. %) from 13.0 to 14.0% Cr, from 30.0 to 32.0% Co, from 0.7 to 0.9% Mo, from 7.0 to 8.0% W, from 0.5 to 6.0% Ta, from 3.8 to 5.5 Al %, up to 0.12% Ti, up to 0.02 Zr %, from 0.4 to 0.8% Hf, up to 0.02% B, from 0.05 to 0.3% C, up to 0.015% Y, up to 0.015% V, from 1.0 to 2.0% Re, and nickel to balance for repair of turbine engine components and other articles manufactured from single crystal materials and other superalloys by manual and automatic gas tungsten arc, plasma arc, laser, and electron beam welding as well as for 3D additive manufacturing.

公开(公告)号：US11830711B2

公开(公告)日：2023-11-28

申请号：US15514634

申请日：2015-09-25

Applicant: JX Nippon Mining & Metals Corporation

Inventor： Kunihiro Oda ,  Takayuki Asano

IPC: H01J37/34 ,  C22C19/07 ,  C23C14/34

CPC classification number: H01J37/3426 ,  C22C19/07 ,  C23C14/3414

Abstract: A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.

公开(公告)号：US20230317369A1

公开(公告)日：2023-10-05

申请号：US18007688

申请日：2021-06-01

Applicant: US Metals Refining Group, Inc.

Inventor： Henry W. Kasaini

IPC: H01F41/02 ,  H01F7/02 ,  H01F1/055 ,  B22F9/20 ,  B22F3/16 ,  B22F5/10 ,  C22C1/04 ,  C22C19/07 ,  C22C30/02 ,  C22C33/02 ,  C22C38/16 ,  C22C38/10 ,  C22C38/06 ,  C22C38/04 ,  C22C38/00

CPC classification number: H01F41/0253 ,  H01F7/0205 ,  H01F1/0557 ,  B22F9/20 ,  B22F3/16 ,  B22F5/106 ,  C22C1/0441 ,  C22C19/07 ,  C22C30/02 ,  C22C33/0235 ,  C22C38/16 ,  C22C38/105 ,  C22C38/06 ,  C22C38/04 ,  C22C38/005 ,  C22C38/002 ,  C22C38/001 ,  B22F2998/10 ,  B22F2201/02 ,  B22F2201/013 ,  C22C2202/02 ,  B22F2301/355 ,  B22F2999/00

Abstract: Methods for the production of magnetic powders, compacted magnetic bodies and sintered magnetic bodies. The methods include the use of metal carboxylate precursor compounds such as metal oxalates. The precursor compounds are heated under pressure to form metal alloy particles which can be directly formed into compacted magnetic bodies or can be further refined by using a reductant at elevated temperatures and pressures. The sintered magnetic bodies may have strong magnetic properties even if produced in the absence of a strong magnetic field.

公开(公告)号：US11769729B2

公开(公告)日：2023-09-26

申请号：US16015045

申请日：2018-06-21

Applicant: Intel Corporation

Inventor： Daniel J. Zierath ,  Michael McSwiney ,  Jason Farmer ,  Akm Shaestagir Chowdhury

IPC: H01L23/532 ,  H01L21/285 ,  H01L21/768 ,  H01L23/522 ,  H01L25/065 ,  C22C19/07 ,  C23C16/02 ,  C22C30/00 ,  C23C16/06 ,  C22C19/03 ,  C23C16/04 ,  C22C19/00

CPC classification number: H01L23/53209 ,  C22C19/00 ,  C22C19/03 ,  C22C19/07 ,  C22C30/00 ,  C23C16/0281 ,  C23C16/045 ,  C23C16/06 ,  H01L21/28556 ,  H01L21/76846 ,  H01L21/76847 ,  H01L21/76849 ,  H01L21/76876 ,  H01L23/5226 ,  H01L23/53223 ,  H01L23/53266 ,  H01L25/0652

Abstract: Provided herein are metal structures that may include a cobalt alloy, a nickel alloy, or nickel, as well as related devices and methods. The metal structures may be formed by chemical vapor deposition (CVD), and may include trace amounts of precursor materials used during the CVD process.

公开(公告)号：US20230227964A1

公开(公告)日：2023-07-20

申请号：US18177244

申请日：2023-03-02

Applicant: JX Nippon Mining & Metals Corporation

Inventor： Manami Masuda ,  Masayoshi Shimizu ,  Yasuyuki Iwabuchi

IPC: C23C14/34 ,  C22C19/07 ,  G11B5/706 ,  H01F1/10 ,  H01F41/18 ,  G11B5/65 ,  C04B35/01 ,  C23C14/08 ,  C23C14/14 ,  H01J37/34

CPC classification number: C23C14/3414 ,  C22C19/07 ,  G11B5/70605 ,  H01F1/10 ,  H01F41/18 ,  G11B5/658 ,  C04B35/01 ,  C23C14/08 ,  C23C14/14 ,  H01J37/3426 ,  C22C32/00

Abstract: Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.