公开(公告)号：US5691803A

公开(公告)日：1997-11-25

申请号：US604302

申请日：1996-02-21

申请人： Jae-kwan Song ,  Jeong-kon Kim ,  Kyoung-shin Park ,  Kyung-sung Bae

发明人： Jae-kwan Song ,  Jeong-kon Kim ,  Kyoung-shin Park ,  Kyung-sung Bae

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70108

摘要： An advanced exposure apparatus combines a quadrupole illumination system and an annular illumination system, and includes a light source, an adjusting portion comprising a filter to limit the light emitted from the light source, a refractive/diffractive portion for refracting and diffracting the light emitted from the adjusting portion and a focussing portion for focussing the light emitted from the refractive/diffractive portion onto a wafer, wherein the filter is provided with first group holes and second group holes comprising four holes, respectively. In an exposure method using such an apparatus, uniform light intensity distribution can be formed on an image formation plane (or wafer) while improved resolution is maintained. Since image formation information (i.e, light passing through a mask pattern) becomes uniform, a very nearly circular contact hole pattern can be formed, to reduce the proximity effect.

摘要翻译： 先进的曝光装置结合了四极照明系统和环形照明系统，并且包括光源，包括用于限制从光源发射的光的滤光器的调节部分，用于折射和衍射从光源发出的光的折射/衍射部分 所述调整部分和用于将从所述折射/衍射部分发射的光聚焦到晶片上的聚焦部分，其中所述滤光器分别设置有包括四个孔的第一组孔和第二组孔。 在使用这种装置的曝光方法中，可以在保持改善的分辨率的同时在图像形成平面（或晶片）上形成均匀的光强度分布。 由于图像形成信息（即，通过掩模图案的光）变得均匀，可以形成非常接近圆形的接触孔图案，以减少邻近效应。

公开(公告)号：US06487472B1

公开(公告)日：2002-11-26

申请号：US09299565

申请日：1999-04-27

申请人： Jae-kwan Song ,  Hoon Cha ,  Yoo-keun Won ,  Dong-cheol Kim

发明人： Jae-kwan Song ,  Hoon Cha ,  Yoo-keun Won ,  Dong-cheol Kim

IPC分类号： G06F1900

CPC分类号： H01L21/67276

摘要： A facility for manufacturing semiconductor devices is provided with a diagnosis system for easily monitoring the operation states of various fabrication systems, and controlling them in case of abnormal operation states by means of a sensing signal from the fabrication systems and a control signal from a control system. The fabrication system outputs a sensing signal showing the operation states of the fabrication processes such as temperature, time, pressure, concentration, power, etc. The control system outputs a control signal to the fabrication systems for controlling their operation states via transmit lines connected thereto according to the sensing signal from the fabrication systems or an input signal from a host computer. The diagnosis system analyzes the sensing signal from the fabrication systems and the control signal from the control system so as to assess the operation states of the fabrication systems. The control system and the diagnosis system are connected to a LAN (Local Area Network) connected to a communication modem, and the fabrication systems are diagnosed via a communication network.

摘要翻译： 一种用于制造半导体器件的设备设置有用于容易地监视各种制造系统的操作状态的诊断系统，并且在来自制造系统的感测信号和来自控制系统的控制信号的异常操作状态的情况下进行控制 。 制造系统输出表示制造过程的操作状态（例如温度，时间，压力，浓度，功率等）的感测信号。控制系统将控制信号输出到制造系统，以通过与其连接的发送线路来控制其操作状态 根据来自制造系统的感测信号或来自主机的输入信号。 诊断系统分析来自制造系统的感测信号和来自控制系统的控制信号，以评估制造系统的操作状态。 控制系统和诊断系统连接到连接到通信调制解调器的LAN（局域网），并且通过通信网络诊断制造系统。