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1.发明授权Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge 有权通过基于平行边缘分解曼哈顿多边形来计算掩模的图像强度公开(公告)号：US08059885B2
公开(公告)日：2011-11-15
申请号：US12015768
申请日：2008-01-17
IPC分类号： G06K9/00
摘要： A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise: decomposing a Manhattan polygon of the mask into decomposed areas based on parallel edges of the Manhattan polygon along only one dimension; determining a convolution of each decomposed area based on a table lookup; determining a sum of coherent systems contribution of the Manhattan polygon based on the convolutions of the decomposed areas; and outputting the determined sum of coherent system contribution for analyzing the mask.
摘要翻译： 公开了一种用于计算集成电路处理中使用的掩模的图像强度的方法，系统，计算机程序产品和表查找系统。 方法可以包括：基于曼哈顿多边形沿着一个维度的平行边缘，将掩模的曼哈顿多边形分解为分解区域; 基于表查找确定每个分解区域的卷积; 基于分解区域的卷积确定曼哈顿多边形的相干系统贡献的总和; 并输出确定的用于分析掩模的相干系统贡献的总和。
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2.发明申请CALCULATING IMAGE INTENSITY OF MASK BY DECOMPOSING MANHATTAN POLYGON BASED ON PARALLEL EDGE 有权基于平行边缘分解曼哈顿多边形计算蒙片的图像强度公开(公告)号：US20090185740A1
公开(公告)日：2009-07-23
申请号：US12015768
申请日：2008-01-17
IPC分类号： G06K9/00
摘要： A method, system, computer program product and table lookup system for calculating image intensity for a mask used in integrated circuit processing are disclosed. A method may comprise: decomposing a Manhattan polygon of the mask into decomposed areas based on parallel edges of the Manhattan polygon along only one dimension; determining a convolution of each decomposed area based on a table lookup; determining a sum of coherent systems contribution of the Manhattan polygon based on the convolutions of the decomposed areas; and outputting the determined sum of coherent system contribution for analyzing the mask.
摘要翻译： 公开了一种用于计算集成电路处理中使用的掩模的图像强度的方法，系统，计算机程序产品和表查找系统。 方法可以包括：基于曼哈顿多边形沿着一个维度的平行边缘，将掩模的曼哈顿多边形分解为分解区域; 基于表查找确定每个分解区域的卷积; 基于分解区域的卷积确定曼哈顿多边形的相干系统贡献的总和; 并输出确定的用于分析掩模的相干系统贡献的总和。
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3.发明授权公开(公告)号：US08605254B2
公开(公告)日：2013-12-10
申请号：US12605732
申请日：2009-10-26
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70083 , G03F7/705
摘要： A method for illuminating a mask to project a desired image pattern into a photoactive material is described. The method includes receiving an image pattern. Determining a relationship between source pixels in a set of source pixels to desired intensities at one or more points in the image pattern is performed. Linear constraints are imposed on a set of intensity values based on one or more contingent intensity condition. The contingent intensity conditions include integer variables specifying contingent constraints. The method includes determining values of the set of intensity values in accordance with the linear constraints, using a constrained optimization algorithm. The set of intensity values represents intensities of a set of source pixels. The set of intensity values are output. Apparatus and computer readable storage media are also described.
摘要翻译： 描述了用于照射掩模以将期望的图像图案投影到光活性材料中的方法。 该方法包括接收图像图案。 确定一组源像素中的源像素与图像图案中的一个或多个点处的期望强度之间的关系。 基于一个或多个偶然强度条件对一组强度值施加线性约束。 偶然强度条件包括规定偶然约束的整数变量。 该方法包括使用约束优化算法根据线性约束来确定强度值集合的值。 强度值集合表示一组源像素的强度。 输出强度值集合。 还描述了装置和计算机可读存储介质。
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4.发明申请Method, Computer Program, Apparatus and System Providing Printing for an Illumination Mask for Three-Dimensional Images 有权方法，计算机程序，设备和系统为三维图像的照明掩模提供打印公开(公告)号：US20090021718A1
公开(公告)日：2009-01-22
申请号：US11778750
申请日：2007-07-17
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70125
摘要： A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described.
摘要翻译： 一种能够提供用于照射光刻掩模的照明源参数以便将三维图像投影到抗蚀剂系统中的方法。 入射光束的光源强度使用近似线性程序确定，并响应允许的变化范围。 详细描述了计算机程序，装置和系统，并对其进行了描述。
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5.发明授权Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images 有权方法，计算机程序，设备和系统，为三维图像的照明掩模提供打印公开(公告)号：US07969554B2
公开(公告)日：2011-06-28
申请号：US11778750
申请日：2007-07-17
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70125
摘要： A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident beams are determined using a near linear program and responsive to an allowed range of variation. Computer program, apparatus and system are detailed and variations are described.
摘要翻译： 一种能够提供用于照射光刻掩模的照明源参数以便将三维图像投影到抗蚀剂系统中的方法。 入射光束的光源强度使用近似线性程序确定，并响应允许的变化范围。 详细描述了计算机程序，装置和系统，并对其进行了描述。
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公开(公告)号：US07944545B2
公开(公告)日：2011-05-17
申请号：US12463742
申请日：2009-05-11
摘要： A structure and a method for an equi-brightness optimization. The method may include projecting a plurality of bright patterns having a plurality of bright points and a plurality of dark patterns having a plurality of dark points on a substrate, generating a plurality of joint eigenvectors of the plurality of bright points and a plurality of dark points, selecting a predetermined number of joint eigenvectors to project the plurality of bright patterns, generating a plurality of natural sampling points from the plurality of bright points, wherein the plurality of natural sampling points has a substantially equal intensity, and obtaining a representation of an aperture from the plurality of natural sampling points, wherein an image of the representation of the aperture has a substantially uniform intensity.
摘要翻译： 用于等亮度优化的结构和方法。 该方法可以包括在衬底上投影具有多个亮点的多个亮图案和具有多个暗点的多个暗图案，产生多个亮点的多个联合特征向量和多个暗点 选择预定数量的联合特征向量以投影所述多个亮图案，从所述多个亮点生成多个自然采样点，其中所述多个自然采样点具有基本相等的强度，并且获得孔径的表示 从所述多个天然采样点开始，其中所述孔的表示的图像具有基本均匀的强度。
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