Component retainer
    2.
    发明授权
    Component retainer 失效
    部件保持架

    公开(公告)号:US6017025A

    公开(公告)日:2000-01-25

    申请号:US637520

    申请日:1996-04-25

    IPC分类号: B32B15/06 B23B31/40

    CPC分类号: B32B15/06

    摘要: An apparatus for accurately positioning and retaining at least one component, comprising a substantially rigid frame comprising a side having at least one opening therein that is larger in size than the component, a layer of compliant material attached to the side of the frame and having at least one opening therein, the frame opening and the layer opening cooperating to define a component receiving opening sized for receiving the component, said component receiving opening having an inner sidewall having at least a portion thereof consisting of compliant material, the compliant material being in substantially uniform contact with the side of the frame.

    摘要翻译: 一种用于精确地定位和保持至少一个部件的装置,包括基本刚性的框架,其包括具有尺寸大于所述部件的至少一个开口的侧面;附接到所述框架侧面的柔性材料层, 所述框架开口和所述层开口配合以限定尺寸适于接收所述部件的部件接收开口,所述部件接收开口具有内侧壁,所述内侧壁的至少一部分由柔性材料组成,所述柔性材料基本上 与框架的侧面均匀接触。

    Formation of punch inspection masks and other devices using a laser
    3.
    发明授权
    Formation of punch inspection masks and other devices using a laser 失效
    使用激光形成冲孔检查面罩和其他设备

    公开(公告)号:US5958628A

    公开(公告)日:1999-09-28

    申请号:US892558

    申请日:1997-07-14

    摘要: Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.

    摘要翻译: 可以使用激光束制造用于电子领域的曝光掩模和检查掩模,其中掩模包括基本上不受暴露于激光束的衬底和衬底上的不透明图案形成层,该图案形成层吸收激光 并且当暴露于激光束时被选择性地蚀刻。 优选的掩模具有外涂层透明层。 提供了一种空腔检查掩模,其具有形成在不透明图案形成层中的线形形式的一系列开口,包围空腔壁的线是掩模,用于确定空腔是否居中定位在基板上和/或 该腔体具有所需尺寸。 还提供了其上包含鉴别面罩的基板,其不能被肉眼看到以防止盗窃。

    Formation of punch inspection masks and other devices using a laser
    4.
    发明授权
    Formation of punch inspection masks and other devices using a laser 失效
    使用激光形成冲孔检查面罩和其他设备

    公开(公告)号:US06207330B1

    公开(公告)日:2001-03-27

    申请号:US09281515

    申请日:1999-03-30

    IPC分类号: G03F900

    CPC分类号: G03F1/68 G03F9/00 H05K3/0002

    摘要: Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.

    摘要翻译: 可以使用激光束制造用于电子领域的曝光掩模和检查掩模,其中掩模包括基本上不受暴露于激光束的衬底和衬底上的不透明图案形成层,该图案形成层吸收激光 并且当暴露于激光束时被选择性地蚀刻。 优选的掩模具有外涂层透明层。 提供了一种空腔检查掩模,其具有形成在不透明图案形成层中的线形形式的一系列开口,包围空腔壁的线是掩模,用于确定空腔是否居中定位在基板上和/或 该腔体具有所需尺寸。 还提供了其上包含鉴别面罩的基板,其不能被肉眼看到以防止盗窃。

    Method of visually inspecting positioning of a pattern on a substrate
    5.
    发明授权
    Method of visually inspecting positioning of a pattern on a substrate 失效
    目视检查图案在基板上的定位的方法

    公开(公告)号:US6127069A

    公开(公告)日:2000-10-03

    申请号:US175854

    申请日:1998-10-20

    摘要: Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.

    摘要翻译: 可以使用激光束制造用于电子领域的曝光掩模和检查掩模,其中掩模包括基本上不受暴露于激光束的衬底和衬底上的不透明图案形成层,该图案形成层吸收激光 并且当暴露于激光束时被选择性地蚀刻。 优选的掩模具有外涂层透明层。 提供了一种空腔检查掩模,其具有形成在不透明图案形成层中的线形形式的一系列开口,包围空腔壁的线是掩模,用于确定空腔是否居中定位在基板上和/或 该腔体具有所需尺寸。 还提供了其上包含鉴别面罩的基板,其不能被肉眼看到以防止盗窃。