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    Phototools having a protective layer
    2.
    发明授权
    Phototools having a protective layer 有权
    具有保护层的摄影工具

    公开(公告)号：US08563221B2

    公开(公告)日：2013-10-22

    申请号：US12922129

    申请日：2009-03-11

    申请人： Zai-Ming Qiu ,  John C. Hulteen ,  Douglas C. Fall

    发明人： Zai-Ming Qiu ,  John C. Hulteen ,  Douglas C. Fall

    IPC分类号： G03F7/016 ,  G03C5/26

    CPC分类号： G03F7/11 ,  G03F1/48 ,  G03F1/54 ,  G03F7/0048 ,  G03F7/0755 ,  G03F7/2014 ,  H05K3/0002

    摘要： A phototool comprises an optically transparent substrate having designed pattern and a protective layer on the substrate. The protective layer comprises a cured hardcoat composition. The hardcoat composition comprises (i) one or more epoxy silane compounds (ii) one or more fluorochemical additives selected from the group consisting of perfluoropolyether-urethane silanes and silane-functionalized perfluoropolyether acrylate oligomers, and (iii) photo-acid generator.

    摘要翻译： 光学工具包括在基板上具有设计图案和保护层的光学透明基板。 保护层包括固化的硬涂层组合物。 硬涂层组合物包含（i）一种或多种环氧硅烷化合物（ii）一种或多种选自全氟聚醚 - 氨基甲酸酯硅烷和硅烷官能化全氟聚醚丙烯酸酯低聚物的含氟化合物添加剂，和（iii）光酸发生剂。

    Printed wiring board fabrication method, printed wiring board photomask, and program for creating a photomask
    4.
    发明申请
    Printed wiring board fabrication method, printed wiring board photomask, and program for creating a photomask 审中-公开
    印刷线路板制造方法，印刷线路板光掩模和用于创建光掩模的程序

    公开(公告)号：US20070034596A1

    公开(公告)日：2007-02-15

    申请号：US11501062

    申请日：2006-08-09

    申请人： Yukihiro Ueno ,  Noboru Okabayashi

    发明人： Yukihiro Ueno ,  Noboru Okabayashi

    IPC分类号： H01B13/00

    CPC分类号： H05K3/06 ,  H05K1/111 ,  H05K3/0002 ,  H05K3/064 ,  H05K2201/09781 ,  H05K2203/056

    摘要： The present invention is configured such that a wiring pattern, formed by forming an etching resist on metal foil that has been layered on an insulating resin board and performing etching via this etching resist, is provided with a circuit pattern constituting an electronic circuit and a dummy pattern provided in the vicinity of and separated from the circuit pattern, such that side etching of the circuit pattern is suppressed by mitigating the rate at which etching advances for the circuit pattern.

    摘要翻译： 本发明被配置为使得通过在金属箔上形成抗蚀剂而形成的布线图案已经层叠在绝缘树脂板上并且经由该抗蚀剂进行蚀刻，形成有构成电子电路和虚拟的电路图案 图案设置在电路图案附近并与电路图案分离，使得通过减轻蚀刻对于电路图案的进行速率来抑制电路图案的侧面蚀刻。

    System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer PCB manufacture
    6.
    发明授权
    System and method for monitoring and improving dimensional stability and registration accuracy of multi-layer PCB manufacture 有权
    监测和提高多层PCB制造尺寸稳定性和配准精度的系统和方法

    公开(公告)号：US06581202B1

    公开(公告)日：2003-06-17

    申请号：US09711366

    申请日：2000-11-10

    申请人： Joseph A. A. M. Tourné ,  Steve Jones ,  Andrew Kelley

    发明人： Joseph A. A. M. Tourné ,  Steve Jones ,  Andrew Kelley

    IPC分类号： G06F1750

    CPC分类号： H05K3/0002 ,  G03F9/00 ,  H05K3/0005 ,  H05K3/4638 ,  H05K2201/09918 ,  H05K2203/056

    摘要： Targets are inserted throughout the layout of a PCB. Post manufacture measurement of the targets are compared to pre-manufacture positions so as to calculate a non-linear regression analysis best fit model. This model is used to predict a feature's location upon or within a PCB given the feature's position on the layout. The non-linear regression analysis results in a set of x and y polynomial equations. These polynomial equations allows for a linear compensation to be applied to the feature position on a layout so as to minimize misregistration of features in the manufacture of PCBs. Models of the features' post production positioning is made before and after linear compensations are made to the pre-manufacture positioning of the features. Graphical presentations using wire frame diagrams and color coded diagrams help identify those areas of the panel that are projected to be in and out of tolerance relative to the specifications.

    摘要翻译： 在PCB的整个布局中插入目标。 将目标的后期制造测量与预制位置进行比较，以计算非线性回归分析最佳拟合模型。 该模型用于根据布局上的特征位置来预测PCB上或PCB内的位置。 非线性回归分析得出一组x和y多项式方程。 这些多项式方程允许将线性补偿施加到布局上的特征位置，以便最小化PCB制造中的特征的不对准。 在对功能的预制定位进行线性补偿之前和之后，对功能的后期制作定位进行了模型化。 使用线框图和颜色编码图的图形演示有助于识别面板中相对于规格进行偏差和超出公差的那些区域。

    Precision fiducial
    7.
    发明申请
    Precision fiducial 失效
    精密基准

    公开(公告)号：US20030039901A1

    公开(公告)日：2003-02-27

    申请号：US10269603

    申请日：2002-10-11

    申请人： Micron Technology, Inc.

    发明人： Mark S. Johnson

    IPC分类号： G03F009/00

    CPC分类号： H05K1/0269 ,  H01L23/544 ,  H01L2223/54473 ,  H01L2924/0002 ,  H05K3/0002 ,  H05K3/0052 ,  H05K3/064 ,  H05K2201/09781 ,  H05K2201/09918 ,  Y10T83/04 ,  H01L2924/00

    摘要： A fiducial includes complementary patterns that are situated symmetrically about a common axis. The complementary patterns permit location of the common axis as an axis that is equidistant from the complementary patterns. The complementary patterns are displaced from the common axes by different distances so that the common axis is located using the complementary patterns nearest the common axis to accurately locate the common axis. The complementary patterns include etch-compensation features that permit the common axis to be accurately located even if an etch process defines the fiducial and the etch process exhibits a process error or variation such as underetching or overetching. The fiducial may be produced by transferring a fiducial pattern from a mask such as a photomask. The fiducial pattern may also be defined on the mask using a computer-aided design program.

    摘要翻译： 基准包括对称关于共同轴线的互补图案。 互补图形允许公共轴的位置作为与互补图案等距的轴。 互补图案从公共轴线移位不同的距离，使得公共轴线使用最接近公共轴线的互补图案来定位，以精确定位公共轴线。 互补图案包括允许公共轴准确定位的蚀刻补偿特征，即使蚀刻工艺限定基准并且蚀刻工艺表现出过程误差或变化，例如不平整或过蚀刻。 可以通过从诸如光掩模的掩模转移基准图来产生基准。 也可以使用计算机辅助设计程序在掩模上定义基准图案。

    Method for manufacturing a composite member
    8.
    发明申请
    Method for manufacturing a composite member 有权
    复合构件的制造方法

    公开(公告)号：US20020197834A1

    公开(公告)日：2002-12-26

    申请号：US10161707

    申请日：2002-06-05

    发明人： Koji Asakawa ,  Yasuyuki Hotta ,  Shigeru Matake ,  Toshiro Hiraoka

    IPC分类号： H01L021/20

    CPC分类号： H05K3/10 ,  H05K1/034 ,  H05K3/0002 ,  H05K3/0082 ,  H05K3/107 ,  H05K3/185 ,  H05K3/422 ,  H05K2201/0116 ,  H05K2201/015 ,  H05K2203/056 ,  H05K2203/107 ,  H05K2203/1147 ,  Y10T29/49155 ,  Y10T29/49215

    摘要： Disclosed is a method for manufacturing a composite member comprising a porous substrate, a via, and a wiring. The method comprises exposing a first region and a second region in the porous substrate to a exposure beam through a mask, the second region exposed by the exposure beam not more than 50% of the exposure of the first region, the exposure beam having the wavelength that an average size of voids of the porous substrate is, as expressed by a radius of gyration, {fraction (1/20)} to 10 times, and forming the via and the wiring by infiltrating a conductive material into the first region and the second region respectively.

    摘要翻译： 公开了一种用于制造包括多孔基底，通孔和布线的复合构件的方法。 该方法包括将多孔基底中的第一区域和第二区域暴露于通过掩模的曝光光束，由曝光光束曝光的第二区域不大于第一区域的曝光的50％，曝光光束具有波长 由旋转半径表示的多孔基材的空隙的平均尺寸为1/20至10倍，并且分别通过将导电材料渗透到第一区域和第二区域中而形成通孔和布线。

    Photomask
    9.
    发明申请
    Photomask 审中-公开
    光掩模

    公开(公告)号：US20020142234A1

    公开(公告)日：2002-10-03

    申请号：US10112386

    申请日：2002-03-28

    发明人： Gregory A. Hansel ,  Chad D. DuBois ,  Donald P. Beadles

    IPC分类号： G03C005/00 ,  G03F009/00

    CPC分类号： G03F1/68 ,  G03F1/54 ,  H05K3/0002

    摘要： A photomask and a method of making one for use in the photolithographic production of integrated circuits, printed circuit boards, etched metal parts and the like. The photomask has a film layer that is composed of a transparent polymer film prepared with a photolithographic image. In one embodiment the polymer film is emulsion based and the photolithographic image is photographically fixed to the film. The photomask includes a rigid transparent substrate such as a piece of glass of high optical quality. An adhesive bonds the polymer film to the glass. The photomask has qualities of a more expensive chrome-on-glass photomask.

    摘要翻译： 光掩模以及用于集成电路，印刷电路板，蚀刻金属部件等的光刻制造中的光掩模和方法。 光掩模具有由用光刻图像制备的透明聚合物膜构成的膜层。 在一个实施方案中，聚合物膜是基于乳液的，并且将光刻图像照相地固定在膜上。 光掩模包括刚性透明基板，例如高质量的玻璃片。 粘合剂将聚合物膜粘合到玻璃上。 光掩模具有更贵的镀铬玻璃光掩模的品质。