公开(公告)号：US06406834B1

公开(公告)日：2002-06-18

申请号：US09588783

申请日：2000-06-07

申请人： Jan Jaap Kuit ,  Jan A. M. Smits ,  Judocus M. D. Stoeldraijer

发明人： Jan Jaap Kuit ,  Jan A. M. Smits ,  Judocus M. D. Stoeldraijer

IPC分类号： G03F720

CPC分类号： G03F7/70466 ,  G03F7/7075

摘要： A method of projecting an image onto a plurality of target areas on a substrate whereby use is made of a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system for imaging an irradiated portion of the mask onto a target area of the substrate, whereby the substrate is to be irradiated with images from at least two different masks, characterized by the following steps: (a) providing a batch of substrates, each at least partially coated with a layer of radiation-sensitive material; (b) providing storage means for temporary storage of the batch; (c) providing a first mask on the mask table; (d) irradiating a first set of target areas of a first substrate with an image from the first mask, and then placing that substrate in the storage means; (e) repeating step (d) for each of the other substrates in the batch; (f) replacing the first mask by a second mask; (g) providing a primary substrate from the storage means on the substrate table and irradiating a second set of target areas of that substrate with an image from the second mask; (h) repeating step (g) for each of the other substrates stored in the storage means.

摘要翻译： 一种将图像投影到基板上的多个目标区域上的方法，由此使用由光刻投影装置构成的光刻投影装置，该光刻投影装置包括：放射线系统，用于提供投影射线束;掩模台，设置有用于保持掩模的掩模支架; 设置有用于保持基板的基板保持器的基板台;用于将所述掩模的照射部分成像到所述基板的目标区域上的投影系统，由此所述基板将被照射来自至少两个不同掩模的图像，其特征在于， 以下步骤：（a）提供一批至少部分地涂覆有辐射敏感材料层的基材;（b）提供用于临时储存批料的储存装置;（c）在掩模上提供第一掩模 （d）用来自第一掩模的图像照射第一衬底的第一组目标区域，然后将该衬底放置在存储装置中;（e）对于每个另外的子层重复步骤（d） （f）通过第二掩模替换第一掩模;（g）从衬底台上的存储装置提供初级衬底并用来自第二掩模的图像照射该衬底的第二组目标区域 ;（h）对存储在存储装置中的每个其他基板重复步骤（g）。