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公开(公告)号：US08446566B2
公开(公告)日：2013-05-21
申请号：US11896600
申请日：2007-09-04
申请人： Jan-Jaap Kuit , Niek Snijders
发明人： Jan-Jaap Kuit , Niek Snijders
CPC分类号： G03F7/709 , G03F7/70533 , G03F7/707 , G03F7/70783 , Y10T29/49826 , Y10T29/53
摘要： The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method includes: a) loading the first object on the second object, b) waiting a predetermined time interval and c) performing a relaxation action. The first object may be a substrate and the second object a substrate table. The first object may also be a substrate table and the second object a support structure, supporting the substrate table.
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公开(公告)号：US07349067B2
公开(公告)日：2008-03-25
申请号：US10892394
申请日：2004-07-16
CPC分类号： G03F7/7075 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
摘要翻译： 提出了一种具有改进的转印单元的光刻设备。 光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束 ，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。 光刻设备还包括包括单个机器人的传送单元。 单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。
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3.发明授权公开(公告)号：US07151590B2
公开(公告)日：2006-12-19
申请号：US10784893
申请日：2004-02-24
申请人： Jan Jaap Kuit
发明人： Jan Jaap Kuit
CPC分类号： G03F7/7075 , G03F7/70991 , Y10S414/135
摘要： A lithographic apparatus and a device manufacturing method is disclosed. In particular, a transport system configured to transport substrates between the lithographic apparatus and a track is disclosed, the track comprising one or more processing devices. The transport system may also transport substrates between the processing devices within the track. In an embodiment, the transport system comprises a transporter pathway along which one or more tracks and lithographic apparatuses are spaced. The substrates can be transported along the transporter pathway by a transporting device adapted to hold a substrate.
摘要翻译： 公开了一种光刻设备和设备制造方法。 具体地，公开了一种配置成在光刻设备和轨道之间传送基板的传送系统，该轨道包括一个或多个处理设备。 传送系统还可以在轨道内的处理装置之间传送衬底。 在一个实施例中，传送系统包括传送器通道，一个或多个轨道和光刻设备沿着该传送器通道间隔开。 衬底可以通过适于保持衬底的传送装置沿着运送器路径传送。
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公开(公告)号：US08634058B2
公开(公告)日：2014-01-21
申请号：US12579083
申请日：2009-10-14
CPC分类号： G03F7/70341 , G03F7/70358
摘要： An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.
摘要翻译： 提供一种浸没式光刻设备，其中基于待暴露的基板的性质和在曝光过程中基板的速度确定基板相对于控制浸没流体的流体限制结构的最大允许速度 相对于流体限制结构被限制在低于该最大允许速度。
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公开(公告)号：US20100020296A1
公开(公告)日：2010-01-28
申请号：US12499595
申请日：2009-07-08
申请人： Jan-Jaap KUIT , Doede Frans KUIPER
发明人： Jan-Jaap KUIT , Doede Frans KUIPER
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70508 , G03F7/707 , G03F7/70775
摘要： A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.
摘要翻译： 一种光刻设备，具有被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 桌子被建造以保持基板; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及致动器，其被布置成对物体施加力，其中所述装置包括热膨胀误差补偿器，所述热膨胀误差补偿器被配置为通过由所述致动器或另一热源消散的任何热量来避免由所述物体的热膨胀引起的误差。
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公开(公告)号：US07131999B2
公开(公告)日：2006-11-07
申请号：US10950674
申请日：2004-09-28
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , H01L21/68707
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 支撑构造成支撑图案形成装置，图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及机器人，其构造成将可交换物体传送到支撑区域和从支撑区域传递，所述机器人包括臂和端部执行器，所述末端执行器包括构造成承载相应可更换物体的第一和第二托架，并且所述末端执行器可旋转地连接到 机器人的臂围绕基本上平行于支撑区域延伸的旋转轴线。
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公开(公告)号：US07130019B2
公开(公告)日：2006-10-31
申请号：US10986182
申请日：2004-11-12
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Carlo Cornelis Maria Luijten , Bernardus Antonius Johannes Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Jaap Kuit
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.
摘要翻译： 提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。 图案形成装置用于使辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统 参考面。 参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。
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公开(公告)号：US06406834B1
公开(公告)日：2002-06-18
申请号：US09588783
申请日：2000-06-07
IPC分类号： G03F720
CPC分类号： G03F7/70466 , G03F7/7075
摘要： A method of projecting an image onto a plurality of target areas on a substrate whereby use is made of a lithographic projection apparatus comprising: a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; a projection system for imaging an irradiated portion of the mask onto a target area of the substrate, whereby the substrate is to be irradiated with images from at least two different masks, characterized by the following steps: (a) providing a batch of substrates, each at least partially coated with a layer of radiation-sensitive material; (b) providing storage means for temporary storage of the batch; (c) providing a first mask on the mask table; (d) irradiating a first set of target areas of a first substrate with an image from the first mask, and then placing that substrate in the storage means; (e) repeating step (d) for each of the other substrates in the batch; (f) replacing the first mask by a second mask; (g) providing a primary substrate from the storage means on the substrate table and irradiating a second set of target areas of that substrate with an image from the second mask; (h) repeating step (g) for each of the other substrates stored in the storage means.
摘要翻译： 一种将图像投影到基板上的多个目标区域上的方法，由此使用由光刻投影装置构成的光刻投影装置，该光刻投影装置包括：放射线系统，用于提供投影射线束;掩模台，设置有用于保持掩模的掩模支架; 设置有用于保持基板的基板保持器的基板台;用于将所述掩模的照射部分成像到所述基板的目标区域上的投影系统，由此所述基板将被照射来自至少两个不同掩模的图像，其特征在于， 以下步骤：（a）提供一批至少部分地涂覆有辐射敏感材料层的基材;（b）提供用于临时储存批料的储存装置;（c）在掩模上提供第一掩模 （d）用来自第一掩模的图像照射第一衬底的第一组目标区域，然后将该衬底放置在存储装置中;（e）对于每个另外的子层重复步骤（d） （f）通过第二掩模替换第一掩模;（g）从衬底台上的存储装置提供初级衬底并用来自第二掩模的图像照射该衬底的第二组目标区域 ;（h）对存储在存储装置中的每个其他基板重复步骤（g）。
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公开(公告)号：US08854598B2
公开(公告)日：2014-10-07
申请号：US12499595
申请日：2009-07-08
申请人： Jan-Jaap Kuit , Doede Frans Kuiper
发明人： Jan-Jaap Kuit , Doede Frans Kuiper
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70508 , G03F7/707 , G03F7/70775
摘要： A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.
摘要翻译： 一种光刻设备，具有被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 桌子被建造以保持基板; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及致动器，其被布置成对物体施加力，其中所述装置包括热膨胀误差补偿器，所述热膨胀误差补偿器被配置为通过由所述致动器或另一热源消散的任何热量来避免由所述物体的热膨胀引起的误差。
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公开(公告)号：US07408615B2
公开(公告)日：2008-08-05
申请号：US10871528
申请日：2004-06-21
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/7075 , H01L21/67742 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
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