-
公开(公告)号:US20200288560A1
公开(公告)日:2020-09-10
申请号:US16652434
申请日:2018-11-22
Applicant: Japan Aerospace Exploration Agency
Inventor: Hitoshi KUNINAKA
Abstract: In a microwave plasma source, a tubular magnet portion has a first opening end and a second opening end. The first opening end has a first polarity, and the second opening end has a second polarity. The tubular body is surrounded by the tubular magnet portion. A first magnetic circuit portion closes the first opening end. A second magnetic circuit portion is disposed opposite to the first magnetic circuit portion. The second magnetic circuit portion has a first opening part. An antenna penetrates the first magnetic circuit portion, is introduced to a space, and supplies microwave power to the space. The nozzle portion has a second opening part that has a smaller opening area than the first opening part and communicates with the first opening part. When an inner diameter of the tubular body is represented by a (mm), and a microwave cutoff wavelength of the microwave power being supplied to the space is represented by λ (mm), the microwave plasma source is configured to satisfy a relational expression λ>3.41×(a/2).
-
公开(公告)号:US20210257122A1
公开(公告)日:2021-08-19
申请号:US17269402
申请日:2019-08-21
Applicant: Japan Aerospace Exploration Agency
Inventor: Yoshitsugu SONE , Hitoshi KUNINAKA , Takeshi TAKASHIMA , Takashi WATANABE
Abstract: A generator (100) of the present invention has a heat source (101) containing a radioisotope substance precursor that becomes a radioisotope substance by irradiation with a neutron and a controller (108) that controls the irradiation with the neutron.
-
公开(公告)号:US20200279722A1
公开(公告)日:2020-09-03
申请号:US16495123
申请日:2018-11-28
Applicant: KASUGA DENKI, INC. , Japan Aerospace Exploration Agency
Inventor: Nobuo NOMURA , Tomofumi MOGAMI , Kazuki MINEMURA , Daiki KODA , Takato MORISHITA , Satoshi HOSODA , Hitoshi KUNINAKA
Abstract: A charge neutralizer that includes a vacuum chamber which is capable of having a charged object installed therein and includes a high vacuum processing unit that performs vapor deposition, and a plasma generator configured to supply plasma caused by an electron cyclotron resonance to an inside of the vacuum chamber. The plasma generator includes a plasma source configured to generate the plasma, and a flange configured to install the plasma source inside the vacuum chamber.
-
-