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1.发明授权Method and apparatus for determining an optical model that models the effect of optical proximity correction 有权用于确定对光学邻近校正的影响进行建模的光学模型的方法和装置公开(公告)号：US07788630B2
公开(公告)日：2010-08-31
申请号：US11726505
申请日：2007-03-21
Applicant: Jianliang Li , Qilang Yan , Lawrence S. Melvin, III
Inventor： Jianliang Li , Qilang Yan , Lawrence S. Melvin, III
CPC classification number: G03F1/36
Abstract: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.
Abstract translation: 一个实施例提供了一种能够使设计者在设计时确定后续处理的效果的系统。 在操作期间，系统可以接收测试布局和对光学系统进行建模但不对后续过程的影响进行建模的光学模型，例如光学邻近校正（OPC）。 系统可以使用测试布局和光学模型生成第一个数据集。 接下来，系统可以将OPC应用于测试布局，并使用校正的测试布局和光学模型生成第二数据集。 然后，系统可以使用第一数据集和第二数据集来调整光学模型以获得对随后过程的影响进行建模的第二光学模型。
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2.发明申请Method and apparatus for determining an optical model that models the effects of optical proximity correction 有权用于确定对光学邻近校正的影响进行建模的光学模型的方法和装置公开(公告)号：US20080235651A1
公开(公告)日：2008-09-25
申请号：US11726505
申请日：2007-03-21
Applicant: Jianliang Li , Qilang Yan , Lawrence S. Melvin
Inventor： Jianliang Li , Qilang Yan , Lawrence S. Melvin
CPC classification number: G03F1/36
Abstract: One embodiment provides a system that can enable a designer to determine the effects of subsequent processes at design time. During operation, the system may receive a test layout and an optical model that models an optical system, but which does not model the effects of subsequent processes, such as optical proximity correction (OPC). The system may generate a first dataset using the test layout and the optical model. Next, the system may apply OPC to the test layout, and generate a second dataset using the corrected test layout and the optical model. The system may then use the first dataset and the second dataset to adjust the optical model to obtain a second optical model that models the effects of subsequent processes.
Abstract translation: 一个实施例提供了一种能够使设计者在设计时确定后续处理的效果的系统。 在操作期间，系统可以接收测试布局和对光学系统进行建模但不对后续过程的影响进行建模的光学模型，例如光学邻近校正（OPC）。 系统可以使用测试布局和光学模型生成第一个数据集。 接下来，系统可以将OPC应用于测试布局，并使用校正的测试布局和光学模型生成第二数据集。 然后，系统可以使用第一数据集和第二数据集来调整光学模型以获得对随后过程的影响进行建模的第二光学模型。
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