公开(公告)号：US07368753B2

公开(公告)日：2008-05-06

申请号：US11019946

申请日：2004-12-23

Applicant: Gee Sung Chae ,  Woo Hyun Kim ,  Yong Bum Kim ,  Jin Wuk Kim

Inventor： Gee Sung Chae ,  Woo Hyun Kim ,  Yong Bum Kim ,  Jin Wuk Kim

IPC: H01L29/04 ,  H01L31/036 ,  G02F1/1343

CPC classification number: G02F1/134363 ,  H01L27/124 ,  H01L27/1288

Abstract: A thin film transistor array substrate includes a first conductive pattern group including a gate electrode of a thin film transistor and a gate line connected to the gate electrode; a semiconductor pattern defining a channel of the thin film transistor; a second conductive pattern group including source and drain electrodes of the thin film transistor and a data line crossing the gate line, a pixel area being defined by the data line crossing the gate line; a third conductive pattern group having a pixel electrode connected to the thin film transistor; and at least one dummy pattern disposed between at least one of the first to third conductive pattern groups and an adjacent one of the semiconductor patterns.

Abstract translation: 薄膜晶体管阵列基板包括：第一导电图案组，其包括薄膜晶体管的栅电极和连接到栅电极的栅极线; 限定薄膜晶体管的沟道的半导体图案; 包括薄膜晶体管的源极和漏极的第二导电图案组和与栅极线交叉的数据线，像素区域由与栅极线交叉的数据线限定; 具有连接到薄膜晶体管的像素电极的第三导电图案组; 以及设置在所述第一至第三导电图案组中的至少一个与所述半导体图案中的相邻一个之间的至少一个虚设图案。

公开(公告)号：US20090041883A1

公开(公告)日：2009-02-12

申请号：US12285508

申请日：2008-10-07

Applicant: Yong Bum Kim ,  Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: H01J9/00

CPC classification number: H01J9/24 ,  B29C33/38 ,  B29C33/42 ,  B29C35/00 ,  B29C59/00 ,  G02F1/13439 ,  H05K3/061 ,  H05K2203/0108 ,  H05K2203/1189

Abstract: This invention relates to a flat panel display and a fabricating method thereof that are adaptive for conducting a patterning process without using a photo process to thereby reduce its process time and minimize pattern defects. A fabricating method and device of a flat panel display according to an embodiment of the present invention spreads an etch-resist on a thin film and forms an etch-resist pattern on a thin film by pressing a soft mold of a permeable structure to the etch-resist.

Abstract translation: 本发明涉及一种平板显示器及其制造方法，该平板显示器及其制造方法适于进行图案化处理而不使用光刻工艺从而减少其处理时间并使图案缺陷最小化。 根据本发明的实施例的平板显示器的制造方法和装置在薄膜上铺展抗蚀剂，并通过将可渗透结构的软模冲压到蚀刻层上而在薄膜上形成抗蚀剂图案 -抗。

公开(公告)号：US07450191B2

公开(公告)日：2008-11-11

申请号：US11019539

申请日：2004-12-23

Applicant: Yong Bum Kim ,  Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: G02F1/136

CPC classification number: H01J9/24 ,  B29C33/38 ,  B29C33/42 ,  B29C35/00 ,  B29C59/00 ,  G02F1/13439 ,  H05K3/061 ,  H05K2203/0108 ,  H05K2203/1189

Abstract: This invention relates to a flat panel display and a fabricating method thereof that are adaptive for conducting a patterning process without using a photo process to thereby reduce its process time and minimize pattern defects. A fabricating method and device of a flat panel display according to an embodiment of the present invention spreads an etch-resist on a thin film and forms an etch-resist pattern on a thin film by pressing a soft mold of a permeable structure to the etch-resist.

Abstract translation: 本发明涉及一种平板显示器及其制造方法，该平板显示器及其制造方法适于进行图案化处理而不使用光刻工艺从而减少其处理时间并使图案缺陷最小化。 根据本发明的实施例的平板显示器的制造方法和装置在薄膜上铺展抗蚀剂，并通过将可渗透结构的软模冲压到蚀刻层上而在薄膜上形成抗蚀剂图案 -抗。

公开(公告)号：US20080127889A1

公开(公告)日：2008-06-05

申请号：US12000914

申请日：2007-12-18

Applicant: Yong Bum Kim ,  Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: B05C9/12

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L51/0014 ,  H01L51/56

Abstract: Disclosed is a method and apparatus for fabricating a patterned thin film layer within a flat panel display that employs a soft mold and heat treatment in place of a photolithographic process. The disclosed method may reduce process time as well as substantially minimize pattern deformities. A method of fabricating a thin film, a method and apparatus of fabricating a flat panel display according to an embodiment of the present invention includes the steps of forming a thin film on a substrate; coating an etch-resist solution including solvent over a substrate where the thin film has been formed; aligning a soft mold on the substrate provided with the etch-resist solution; forming a patterned etch-resist layer on the thin film by forming the etch-resist solution through a first heat treatment below the vaporization temperature of the solvent while pressure is applied to the soft mold on the etch-resist solvent; separating the soft mold from the patterned etch-resist layer; solidifying the patterned etch-resist layer through a second heat treatment; and etching the thin film by using the patterned etch-resist layer as a mask.

公开(公告)号：US07329619B2

公开(公告)日：2008-02-12

申请号：US10973984

申请日：2004-10-27

Applicant: Yong Bum Kim ,  Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: H01L21/31

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L51/0014 ,  H01L51/56

Abstract: Disclosed is a method and apparatus for fabricating a patterned thin film layer within a flat panel display that employs a soft mold and heat treatment in place of a photolithographic process. The disclosed method may reduce process time as well as substantially minimize pattern deformities. A method of fabricating a thin film, a method and apparatus of fabricating a flat panel display according to an embodiment of the present invention includes the steps of forming a thin film on a substrate; coating an etch-resist solution including solvent over a substrate where the thin film has been formed; aligning a soft mold on the substrate provided with the etch-resist solution; forming a patterned etch-resist layer on the thin film by forming the etch-resist solution through a first heat treatment below the vaporization temperature of the solvent while pressure is applied to the soft mold on the etch-resist solvent; separating the soft mold from the patterned etch-resist layer; solidifying the patterned etch-resist layer through a second heat treatment; and etching the thin film by using the patterned etch-resist layer as a mask.

Abstract translation: 公开了一种用于在平板显示器内制造图案化薄膜层的方法和装置，其采用软模和热处理代替光刻工艺。 所公开的方法可以减少处理时间并且基本上最小化图案畸形。 根据本发明的实施例的制造薄膜的方法，制造平板显示器的方法和装置包括在基板上形成薄膜的步骤; 在其上形成有薄膜的基板上涂覆包括溶剂的抗蚀剂溶液; 在设置有抗蚀剂溶液的基板上对准软模具; 通过在低于溶剂的蒸发温度的第一热处理下形成抗蚀剂溶液，同时在抗蚀剂溶剂上施加压力施加到软模上，在薄膜上形成图案化的抗蚀剂层; 将软模与图案化的抗蚀剂层分离; 通过第二热处理固化图案化的抗蚀剂层; 并通过使用图案化的抗蚀剂层作为掩模来蚀刻薄膜。

公开(公告)号：US09997324B2

公开(公告)日：2018-06-12

申请号：US12285508

申请日：2008-10-07

Applicant: Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: B29C33/38 ,  B29C33/42 ,  B29C35/00 ,  B29C59/00 ,  H01J9/00 ,  H01J9/24 ,  G02F1/1343 ,  H05K3/06

CPC classification number: H01J9/24 ,  B29C33/38 ,  B29C33/42 ,  B29C35/00 ,  B29C59/00 ,  G02F1/13439 ,  H05K3/061 ,  H05K2203/0108 ,  H05K2203/1189

Abstract: This invention relates to a flat panel display and a fabricating method thereof that are adaptive for conducting a patterning process without using a photo process to thereby reduce its process time and minimize pattern defects. A fabricating method and device of a flat panel display according to an embodiment of the present invention spreads an etch-resist on a thin film and forms an etch-resist pattern on a thin film by pressing a soft mold of a permeable structure to the etch-resist.

公开(公告)号：US07742126B2

公开(公告)日：2010-06-22

申请号：US11102872

申请日：2005-04-11

Applicant: Yong Bum Kim ,  Jin Wuk Kim

Inventor： Yong Bum Kim ,  Jin Wuk Kim

IPC: G02F1/1335 ,  G02F1/13

CPC classification number: G02B5/223 ,  G02B5/201 ,  G02F1/133512 ,  G02F1/133514 ,  G02F1/133516

Abstract: There is disclosed a liquid crystal display panel that is adaptive for simplifying its process and reducing its cost by performing a patterning process without using a photolithography process, and a fabricating method thereof.A liquid crystal display panel according to an embodiment of the present invention includes a color filter which is formed by a press forming by a soft mold; and a black matrix to divide the color filter by the cell.

Abstract translation: 公开了一种液晶显示面板及其制造方法，其适于简化其工艺并通过在不使用光刻工艺的情况下执行图案化工艺来降低成本。 根据本发明实施例的液晶显示面板包括通过软模压制成形形成的滤色器; 以及黑色矩阵，以将滤色器与细胞分开。