公开(公告)号：US20100128235A1

公开(公告)日：2010-05-27

申请号：US12700602

申请日：2010-02-04

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US09110389B2

公开(公告)日：2015-08-18

申请号：US13241837

申请日：2011-09-23

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US20120008117A1

公开(公告)日：2012-01-12

申请号：US13240978

申请日：2011-09-22

申请人： Joannes Theodoor DE SMIT ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor DE SMIT ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

公开(公告)号：US08363208B2

公开(公告)日：2013-01-29

申请号：US12700602

申请日：2010-02-04

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Theodorus Marinus Modderman ,  Marcel Mathijs Theodore Marie Dierichs

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Theodorus Marinus Modderman ,  Marcel Mathijs Theodore Marie Dierichs

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

公开(公告)号：US07684008B2

公开(公告)日：2010-03-23

申请号：US10860662

申请日：2004-06-04

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Marcel Mathijs Theodore Marie Dierichs ,  Theodorus Marinus Modderman

IPC分类号： G03B27/52 ,  G03B27/32 ,  G03C5/00

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US07317504B2

公开(公告)日：2008-01-08

申请号：US10820227

申请日：2004-04-08

申请人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Theodorus Marinus Modderman ,  Marcel Mathijs Theodore Marie Dierichs

发明人： Joannes Theodoor De Smit ,  Vadim Yevgenyevich Banine ,  Theodorus Hubertus Josephus Bisschops ,  Theodorus Marinus Modderman ,  Marcel Mathijs Theodore Marie Dierichs

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/32 ,  G03C5/00 ,  B06B1/00

CPC分类号： G03F7/70341

摘要： A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基板之间的成像场。 检测并去除从溶解的大气中的液体中形成的液体或暴露于液体的装置元件的气体排出的气泡，使得它们不会干扰曝光并导致基板上的印刷缺陷。 检测可以通过测量液体中超声波衰减的频率依赖性进行，气泡去除可以通过对液体进行脱气和加压来实现，使用低表面张力的液体从大气中分离出液体，从而提供连续的液体流通 成像领域和相移超声波驻波节点模式。

公开(公告)号：US07800079B2

公开(公告)日：2010-09-21

申请号：US10740829

申请日：2003-12-22

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Victorvitch Sidelnikov ,  Marcel Mathijs Theodore Marie Dierichs ,  Marius Ravensbergen

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Yurii Victorvitch Sidelnikov ,  Marcel Mathijs Theodore Marie Dierichs ,  Marius Ravensbergen

IPC分类号： G21G5/00

CPC分类号： G03F7/70916 ,  G03F7/7085

摘要： An assembly for detection of at least one of radiation flux and contamination on an optical component includes a detector configured to receive at least one of the radiation flux and contamination, and when the assembly is in use, to generate a detector signal correlated to at least one of the radiation flux and contamination on the component. A meter is configured to measure the detector signal. The detector includes at least one wire.

摘要翻译： 用于检测光学部件上的辐射通量和污染物中的至少一种的组件包括被配置为接收辐射通量和污染物中的至少一种的检测器，并且当使用该组件时，生成与至少相关的检测器信号 辐射通量和部件污染之一。 仪表被配置为测量检测器信号。 检测器包括至少一根线。

公开(公告)号：US20180203364A1

公开(公告)日：2018-07-19

申请号：US15918575

申请日：2018-03-12

申请人： Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sofia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

发明人： Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sofia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US09188881B2

公开(公告)日：2015-11-17

申请号：US13376761

申请日：2010-05-04

申请人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

发明人： Marcel Mathijs Theodore Marie Dierichs ,  Markus Franciscus Antonius Eurlings ,  Hendrikus Robertus Marie Van Greevenbroek ,  Antonie Hendrik Verweij

IPC分类号： G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70941 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70283

摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.

摘要翻译： 光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予 辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。 掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。 遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

公开(公告)号：US08755027B2

公开(公告)日：2014-06-17

申请号：US13226037

申请日：2011-09-06

申请人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

发明人： Matthew Lipson ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk ,  Ronald Wilklow ,  Roel De Jonge

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.

摘要翻译： 一种用于在光刻设备的一部分中提供包括液体的流体的流体系统，所述流体系统包括歧管以混合第一液体组分和第二组分以在所述光刻设备的所述部分中形成所述流体;控制器， 通过控制用于形成流体的第一和/或第二部件的量来控制流体的物理性质;以及测量装置，用于测量流体的性质并使反馈可用于控制器，其中控制器被配置成控制 基于测量属性的流体的物理性质。