利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

185 条记录 (耗时 0.033 秒)

    Optical beam transformation system and illumination system comprising an optical beam transformation system
    1.
    发明申请
    Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
    光束变换系统和包括光束变换系统的照明系统

    公开(公告)号：US20060146384A1

    公开(公告)日：2006-07-06

    申请号：US11271976

    申请日：2005-11-14

    申请人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    发明人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    IPC分类号： G03H1/08

    CPC分类号： G03F7/70183 ,  G02B5/32 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/095 ,  G02B27/0977 ,  G03F7/70108 ,  G03F7/70566

    摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.

    摘要翻译： 可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布 光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。 光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射 用于转化面。 光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。 具有转轴表面的Axicon元件可用作转换元件。

    Optical beam transformation system and illumination system comprising an optical beam transformation system
    2.
    发明授权
    Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
    光束变换系统和包括光束变换系统的照明系统

    公开(公告)号：US07511886B2

    公开(公告)日：2009-03-31

    申请号：US11271976

    申请日：2005-11-14

    申请人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    发明人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72

    CPC分类号： G03F7/70183 ,  G02B5/32 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/095 ,  G02B27/0977 ,  G03F7/70108 ,  G03F7/70566

    摘要： An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include an optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface.

    摘要翻译： 光束变换系统具有沿着光束转换系统的光轴布置的一系列光学元件，其被设计用于将入射光束分布到光束转换系统的入射面上，使得入射光分布从出射表面出射的出射光分布 的光束转换系统通过光强度的径向再分布。 光学元件包括变换元件，其导致光强度的径向重新分布并且具有相对于光轴倾斜的变换表面，并且根据转变表面的效率对称特性引起入射在相变表面上的光分布的偏振选择反射 。 光学元件还包括光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，在变换表面处实现由偏振选择反射引起的透射不均匀性的空间依赖补偿。

    Illumination system for a microlithography projection exposure installation
    3.
    发明授权
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US07714983B2

    公开(公告)日：2010-05-11

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
    4.
    发明申请
    ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
    用于微观投影曝光安装的照明系统

    公开(公告)号：US20100195077A1

    公开(公告)日：2010-08-05

    申请号：US12758554

    申请日：2010-04-12

    申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Illumination system for a microlithography projection exposure installation
    5.
    发明申请
    Illumination system for a microlithography projection exposure installation 有权
    用于微光刻投影曝光装置的照明系统

    公开(公告)号：US20070165202A1

    公开(公告)日：2007-07-19

    申请号：US10571475

    申请日：2004-09-13

    申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/702

    摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

    摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

    Illumination system having a light mixer for the homogenization of radiation distributions
    8.
    发明申请
    Illumination system having a light mixer for the homogenization of radiation distributions 审中-公开
    具有用于辐射分布均匀化的光混合器的照明系统

    公开(公告)号：US20050280821A1

    公开(公告)日：2005-12-22

    申请号：US11147931

    申请日：2005-06-08

    申请人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

    发明人： Damian Fiolka ,  Wolfgang Singer ,  Johannes Wangler

    IPC分类号： G01B11/00 ,  G02B27/28 ,  G03F7/20

    CPC分类号： G03F7/70583 ,  G02B27/283 ,  G03F7/70075

    摘要： An illumination system of a microlithographic projection exposure apparatus contains a light mixer for the homogenization of radiation distributions. The latter may, in one embodiment, comprise at least one plane beam-splitter layer which is arranged between two transparent sub-elements, parallel to an optical axis of the illumination system. An alternative embodiment of a light mixer contains at least one row of beam splitters, wherein the beam splitters in at least one row are arranged mutually parallel, at an inclination angle with respect to an entry-side optical axis of the illumination system, and offset behind one another in a direction perpendicular to the entry-side optical axis.

    摘要翻译： 微光刻投影曝光装置的照明系统包含用于辐射分布均匀化的光混合器。 在一个实施例中，后者可以包括布置在平行于照明系统的光轴的两个透明子元件之间的至少一个平面分束器层。 光混合器的替代实施例包含至少一排分束器，其中至少一排中的分束器相对于照明系统的入射侧光轴以倾斜角相互平行地布置，并且偏移 在与入射侧光轴垂直的方向上彼此相邻。

    Microlithographic illumination system
    10.
    发明授权
    Microlithographic illumination system 有权
    微光刻照明系统

    公开(公告)号：US08705005B2

    公开(公告)日：2014-04-22

    申请号：US12190179

    申请日：2008-08-12

    申请人： Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    发明人： Markus Deguenther ,  Michael Layh ,  Michael Gerhard ,  Bruno Thome ,  Wolfgang Singer

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70191

    摘要： A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.

    摘要翻译： 微光刻照明系统可以包括能够在第一照明平面中产生二维强度分布的配光装置。 光栅元件的第一光栅阵列可以产生二次光源的光栅阵列。 具有附加光学效果的装置可以被布置在与两个光栅阵列相邻的空间上。 该装置可以被配置为照明角度变化装置。 该装置可以影响照明光的强度和/或相位和/或光束方向。 影响可以是使光栅元素对总照明强度的贡献度可以在整个照明场中变化。 这可以使照明强度以相对于总照明强度和/或相对于来自不同照明方向的强度贡献的限定方式影响整个照明场。