公开(公告)号：US20100195077A1

公开(公告)日：2010-08-05

申请号：US12758554

申请日：2010-04-12

申请人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess KOEHLER ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US20070165202A1

公开(公告)日：2007-07-19

申请号：US10571475

申请日：2004-09-13

申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US06900946B2

公开(公告)日：2005-05-31

申请号：US10793247

申请日：2004-03-05

申请人： Jess Koehler

发明人： Jess Koehler

IPC分类号： G02B13/14 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  G02B15/14

CPC分类号： G03F7/70183 ,  G02B13/143 ,  G02B13/22 ,  G02B15/173 ,  G03F7/70075

摘要： A zoom system that is particularly suited to use on an illumination device of a microlithographic projection exposure system and is configured in the form of a focal-length-zooming lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. Both an intermediate pupillary plane (25) that is conjugate to the image plane and an intermediate field plane (27) that is a Fourier transform of the image plane lie between the object plane (6) and image plane (8). At least one movable lens (31, 32) is arranged in the vicinity of these intermediate image planes (25, 27). The system is characterized by a large expansion of the illuminated area on the image plane for short lengths of travel and light weights of these movable lenses (31, 32).

摘要翻译： 一种变焦系统，其特别适用于微光刻投影曝光系统的照明装置，并且被配置为焦距变焦透镜的形式。 变焦系统的透镜定义物体平面（6）和作为物平面的傅里叶变换的图像平面（8）。 与图像平面共轭的中间瞳孔平面（25）和作为图像平面的傅立叶变换的中间场平面（27）位于物平面（6）和图像平面（8）之间。 在这些中间图像平面（25,27）附近布置有至少一个可移动透镜（31,32）。 该系统的特征在于，对于这些可移动透镜（31,32）的短行程和轻重量，图像平面上的照明区域的扩大很大。

公开(公告)号：US07714983B2

公开(公告)日：2010-05-11

申请号：US10571475

申请日：2004-09-13

申请人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

发明人： Jess Koehler ,  Johannes Wangler ,  Markus Brotsack ,  Wolfgang Singer ,  Damian Fiolka ,  Manfred Maul

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70116 ,  G03F7/702

摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

摘要翻译： 用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。 照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中 。 配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。 该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

公开(公告)号：US07583787B2

公开(公告)日：2009-09-01

申请号：US11928676

申请日：2007-10-30

申请人： Albrecht Frey ,  Norbert Pailer ,  Jess Koehler

发明人： Albrecht Frey ,  Norbert Pailer ,  Jess Koehler

IPC分类号： G21K7/00

CPC分类号： G21K1/06 ,  G21K2201/064 ,  G21K2201/067

摘要： A device for improving resolution capability of an x-ray optical apparatus for an x-ray incident from a direction of incidence includes a mirror element including a mirror edge formed as a cylindrical shell section around an edge axis. The mirror element is spaced apart, in a radial direction, from a focal axis that is parallel to the direction of incidence. The edge axis is oriented at a first non-zero angle relative to the focal axis when viewed along a radial axis. The edge axis is oriented at a second non-zero angle relative to the focal axis.

摘要翻译： 用于提高从入射方向入射的x射线的X射线光学装置的分辨能力的装置包括：镜子元件，其包括形成为围绕边缘轴线的圆筒形壳体部分的镜面边缘。 反射镜元件在径向方向上与平行于入射方向的焦点轴线间隔开。 当沿着径向轴线观察时，边缘轴线相对于焦轴以第一非零角度定向。 边缘轴线相对于焦点轴线定向成第二非零角度。

公开(公告)号：US07202467B2

公开(公告)日：2007-04-10

申请号：US10979167

申请日：2004-11-03

申请人： Jess Koehler ,  Wolfgang Holota

发明人： Jess Koehler ,  Wolfgang Holota

IPC分类号： G01B11/00

CPC分类号： G02B26/12 ,  G01S7/481 ,  G01S7/4817 ,  G01S17/42 ,  G01S17/933

摘要： A system is described for the optical detection of a distant object, having a light beam generating device for generating a parallel light beam, a scanning unit for generating a scan pattern by deflecting the parallel light beam over a defined angular range, and a detector unit for detecting light reflected by the distant object. The scanning unit includes a rotating polygonal mirror with several reflecting partial mirror surfaces. The light beam generating device is provided for generating a parallel light beam in two different beam positions which, in response to a rotating position indicating signal indicating the rotating position of the polygonal mirror, can be switched over from a partial mirror surface to an adjacent partial mirror surface. Accordingly, a system is provided for the optical direction of a distant object, which system has a high capacity. In particular, the system permits the optical detection of distant objects, such as poorly recognizable obstacles, in the air space in the flight direction in front of an aircraft.

摘要翻译： 描述了一种具有用于产生平行光束的光束产生装置的远距离物体的光学检测系统，用于通过使平行光束偏转限定的角度范围来产生扫描图案的扫描单元和检测器单元 用于检测由远处物体反射的光。 扫描单元包括具有多个反射部分镜面的旋转多面镜。 光束产生装置被设置用于在两个不同的光束位置中产生平行光束，其响应于指示多角镜的旋转位置的旋转位置指示信号，可以从部分镜面切换到相邻部分 镜面。 因此，为远方物体的光学方向提供一种系统，该系统具有高容量。 特别地，该系统允许在飞机前面的飞行方向上的空气空间中对遥远物体（例如识别不良的障碍物）进行光学检测。

公开(公告)号：US20060221453A1

公开(公告)日：2006-10-05

申请号：US11375552

申请日：2006-03-15

申请人： Jess Koehler ,  Damian Fiolka

发明人： Jess Koehler ,  Damian Fiolka

IPC分类号： G02B27/10

CPC分类号： G03F7/70075 ,  G02B5/3083 ,  G02B27/285 ,  G03F7/70566

摘要： A fly's eye condenser (15) for converting an input light distribution into an output light distribution has at least one raster arrangement of optical groups (21, 22), of which at least some comprise polarization-changing means (30) suitable for changing polarization. The polarization-changing means include at least one layer of birefringent material associated with an optical group. The layer of birefringent material of at least two optical groups has a different thickness in a passage direction of the light. The fly's eye condenser thus permits specific, location-dependent control of the polarization state of the output light distribution. If the fly's eye condenser is used in an illumination system (10), then it can be used not only to homogenize the light distribution on the illumination plane of the illumination system but, at the same time, a location-dependent or angle-dependent polarization distribution can also be set in the illumination plane.

摘要翻译： 用于将输入光分布转换成输出光分布的蝇眼聚光器（15）具有光学组（21,22）的至少一个光栅装置，其中至少一些包括适于改变偏振的偏振改变装置（30） 。 偏振改变装置包括与光学组相关联的至少一层双折射材料。 至少两个光学组的双折射材料层在光的通过方向上具有不同的厚度。 因此，蝇眼聚光器允许对输出光分布的偏振态的特定的，位置相关的控制。 如果在照明系统（10）中使用蝇眼聚光器，则不仅可以将照明系统的照明平面上的光分布均匀化，而且可以同时使用位置相关或角度依赖 也可以在照明平面中设置极化分布。

公开(公告)号：US07027235B2

公开(公告)日：2006-04-11

申请号：US10728814

申请日：2003-12-08

申请人： Jess Koehler

发明人： Jess Koehler

IPC分类号： G02B5/30 ,  G02B17/00

CPC分类号： G03F7/70566 ,  G02B13/143 ,  G02B27/286 ,  G03F7/70191

摘要： An optical system for providing a useful light beam, having one or more optical components (3, 4, 5) which attenuate a useful light fraction with a first linear polarization state less strongly than a useful light fraction with a second linear polarization state different from the first state. A compensation unit is provided which includes a transmission plate (9) that is introduced into the useful light beam path (7) inclined (β) to the optical axis, and attenuates the useful light fraction with the first linear polarization state more strongly than that with the second linear polarization state. As a result, the imbalance, caused by the system without a compensation unit, of the two useful light fractions can be compensated completely or in any case partially. The optical system is used, for example, in illuminating systems and projection objectives of microlithographic projection exposure apparatuses.

摘要翻译： 一种用于提供有用光束的光学系统，其具有一个或多个光学部件（3,4,5），该光学部件衰减具有不同于第二线偏振态的有用光分数的第一线性偏振状态的有用光分数 第一个状态。 提供了一种补偿单元，其包括被引入到与光轴倾斜（β）的有用光束路径（7）中的透射板（9），并且比第一线性极化状态更强烈地衰减有用光分数 具有第二线性极化状态。 结果，由两个有用的轻馏分的无补偿单元的系统引起的不平衡可以被完全补偿，或者在任何情况下均可部分补偿。 光学系统例如用于微光刻投影曝光装置的照明系统和投影物镜。

公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US06864960B2

公开(公告)日：2005-03-08

申请号：US10234143

申请日：2002-09-05

申请人： Jess Koehler ,  Johannes Wangler

发明人： Jess Koehler ,  Johannes Wangler

IPC分类号： G02B15/177 ,  G03F7/20 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70183 ,  G02B15/177

摘要： A zoom system for an illumination device of a microlithographic projection exposure system is configured in the form of a focal-length zoom lens. The lenses of the zoom system define an object plane (6) and an image plane (8) that is a Fourier transform of the object plane. The zoom system is characterized by a large expansion of the illuminated area in the image plane, where expansion factors (D) in excess of four are feasible and are obtained by employing lens groups (33, 36) that are movable over large moving ranges.

摘要翻译： 用于微光刻投影曝光系统的照明装置的变焦系统被配置为焦距变焦透镜的形式。 变焦系统的透镜定义物体平面（6）和作为物平面的傅里叶变换的图像平面（8）。 变焦系统的特征在于图像平面中的照明区域的大的扩展，其中超过4的扩展因子（D）是可行的，并且通过使用可在大移动范围上移动的透镜组（33,36）获得。