公开(公告)号：US20060249693A1

公开(公告)日：2006-11-09

申请号：US11451352

申请日：2006-06-13

申请人： Johannes Driessen ,  Hermanus Joannes Rene Soemers ,  Michael Mathijs Renkens ,  Theodorus Josephus Bisschops ,  Johannes Martinus Bernardus Vermeulen ,  Antonius Rijken

发明人： Johannes Driessen ,  Hermanus Joannes Rene Soemers ,  Michael Mathijs Renkens ,  Theodorus Josephus Bisschops ,  Johannes Martinus Bernardus Vermeulen ,  Antonius Rijken

IPC分类号： G01N23/00

CPC分类号： G03F7/70691 ,  G01N23/04 ,  G03F7/70991

摘要： A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

摘要翻译： 光刻投影设备包括向诸如物体台和/或相关联的电动机和/或传感器的真空室中的部件供应电力的导管。 通过与其相关联的物体表具有至少相同数量的自由度的管道导管，将导管屏蔽到暴露于真空。

公开(公告)号：US20050024609A1

公开(公告)日：2005-02-03

申请号：US10860662

申请日：2004-06-04

申请人： Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

发明人： Joannes De Smit ,  Vadim Banine ,  Theodorus Josephus Bisschops ,  Marcel Mathijs Dierichs ,  Theodorus Modderman

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/00 ,  G03F7/00

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。