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公开(公告)号：US4150992A
公开(公告)日：1979-04-24
申请号：US862720
申请日：1977-12-27
申请人： John W. Meadows , Robert J. Ritter
发明人： John W. Meadows , Robert J. Ritter
摘要： A processor for developing diazo film defined by a pair of flat platens disposed within a housing and spaced apart a distance only slightly greater than the thickness of the film. The housing includes intake and outlet openings aligned with the space between the platens and means for advancing an incoming film from the intake opening, through the space between the platens and for discharging it through the outlet opening. The platen facing the emulsion side of the film is heated and includes at least one passage through which a metered amount of aqueous ammonia is passed for each film that is to be developed. The ammonia is vaporized in the passage and discharged against the emulsion side of the film. A transverse groove in the emulsion facing surface of the platen communicates with the passage to distribute the ammonia vapor over the full width of the film. The developing temperature is between about 150.degree.-200.degree. F., the ammonia vapor pressure does not substantially exceed atmospheric pressure and developing times are no more than a few seconds.
摘要翻译： 一种用于显影重氮膜的处理器，其由设置在壳体内且间隔开一段距离的一对平板限定，该距离仅略大于膜的厚度。 壳体包括与压板之间的空间对准的进出口和用于使进入的膜从进气开口前进的装置，通过压板之间的空间并将其通过出口排出。 面对膜的乳液侧的压板被加热，并且包括至少一个通道，对于待显影的每个膜，通过计量的氨水通过。 氨在通道中蒸发并且抵靠膜的乳液侧排出。 压板的面向乳剂的表面中的横向槽与通道连通，以将氨蒸气分布在膜的整个宽度上。 显影温度在约150°-200°F之间，氨蒸汽压力基本上不超过大气压，显影时间不超过几秒。
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公开(公告)号：US4255037A
公开(公告)日：1981-03-10
申请号：US897081
申请日：1978-04-17
申请人： John W. Meadows , Robert J. Ritter
发明人： John W. Meadows , Robert J. Ritter
摘要： A processor for developing diazo film defined by a pair of flat platens disposed within a housing and spaced apart a distance only slightly greater than the thickness of the film. The housing includes intake and outlet openings aligned with the space between the platens and means for advancing an incoming film from the intake opening, through the space between the platens and for discharging it through the outlet opening. The platen facing the emulsion side of the film is heated and includes at least one passage through which a metered amount of aqueous ammonia is passed for each film that is to be developed. The ammonia is vaporized in the passage and discharged against the emulsion side of the film. A transverse groove in the emulsion facing surface of the platen communicates with the passage to distribute the ammonia vapor over the full width of the film. The developing temperature is between about 150.degree.-200.degree. F., the ammonia vapor pressure does not substantially exceed atmospheric pressure and developing times are not more than a few seconds.
摘要翻译： 一种用于显影重氮膜的处理器，其由设置在壳体内且间隔开一段距离的一对平板限定，该距离仅略大于膜的厚度。 壳体包括与压板之间的空间对准的进出口和用于使进入的膜从进气开口前进的装置，通过压板之间的空间并将其通过出口排出。 面对膜的乳液侧的压板被加热，并且包括至少一个通道，对于待显影的每个膜，通过计量的氨水通过。 氨在通道中蒸发并且抵靠膜的乳液侧排出。 压板的面向乳剂的表面中的横向槽与通道连通，以将氨蒸气分布在膜的整个宽度上。 显影温度在约150°-200°F之间，氨蒸汽压力基本上不超过大气压，显影时间不超过几秒。
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公开(公告)号：US5721664A
公开(公告)日：1998-02-24
申请号：US767053
申请日：1996-12-16
CPC分类号： H01C8/04
摘要： A surge arrester designed for use with lines of 2 kV or less has a housing (10) which, in combination with a cup-shaped gasket (25), an O-ring gasket (45) and a lid (20), seals a varistor element (30) inside against environmental contaminants such as water or pollutants.
摘要翻译： 设计用于2kV或更小的线路的浪涌放电器具有壳体（10），其与杯形垫圈（25），O形环垫圈（45）和盖子（20）组合，密封 内部抵抗环境污染物如水或污染物的变阻器元件（30）。
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