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1.发明授权Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same 有权制造使用其制造喷墨打印头和喷墨打印头的方法公开(公告)号：US08293123B2
公开(公告)日：2012-10-23
申请号：US12213767
申请日：2008-06-24
申请人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
发明人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
IPC分类号： G01D15/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1645 , B41J2/1646 , G03F7/0233 , G03F7/0385 , G03F7/0392 , Y10T29/49401
摘要： A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.
摘要翻译： 一种制造喷墨打印头的方法，其中包括在正性光致抗蚀剂组合物中的溶剂或用于形成牺牲层的非感光性可溶性聚合物组合物中的溶剂与负性光致抗蚀剂组合物中包含的溶剂的极性不同 用于形成通道形成层和喷嘴层中的至少一个。
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2.发明申请Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same 有权制造使用其制造喷墨打印头和喷墨打印头的方法公开(公告)号：US20090179000A1
公开(公告)日：2009-07-16
申请号：US12213767
申请日：2008-06-24
申请人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
发明人： Jong-jin Park , Su-min Kim , Jin-baek Kim , Yong-ung Ha , Yong-seop Yoon , Byung-ha Park
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1645 , B41J2/1646 , G03F7/0233 , G03F7/0385 , G03F7/0392 , Y10T29/49401
摘要： A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.
摘要翻译： 一种制造喷墨打印头的方法，其中包括在正性光致抗蚀剂组合物中的溶剂或用于形成牺牲层的非感光性可溶性聚合物组合物中的溶剂与负性光致抗蚀剂组合物中包含的溶剂的极性不同 用于形成通道形成层和喷嘴层中的至少一个。
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3.发明申请OXETANE-CONTAINING COMPOUND, PHOTORESIST COMPOSITION HAVING THE SAME, METHOD OF PREPARING PATTERN USING THE PHOTORESIST COMPOSITION, AND INKJET PRINT HEAD INCLUDING POLYMERIZATION PRODUCTS OF THE OXETANE-CONTAINING COMPOUND 失效含有含氧化合物的化合物，具有该组合物的光电组合物，使用光电组合物制备图案的方法，以及包含含OCOE组合物的聚合产物的喷墨印刷头公开(公告)号：US20080131787A1
公开(公告)日：2008-06-05
申请号：US11768632
申请日：2007-06-26
申请人： Kyu-sik Kim , Jin-baek Kim , Young-ung Ha , Byung-ha Park , Ji-young Park , Su-min Kim
发明人： Kyu-sik Kim , Jin-baek Kim , Young-ung Ha , Byung-ha Park , Ji-young Park , Su-min Kim
IPC分类号： G03C5/00 , C07D305/06
CPC分类号： C07D305/06 , C08L61/06 , G03F7/038 , Y10S430/115
摘要： An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.
摘要翻译： 含有氧杂环丁烷的化合物，包含其的光致抗蚀剂组合物，使用光致抗蚀剂组合物制备图案的方法，以及包含含氧杂环丁烷化合物的聚合产物的喷墨打印头。
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4.发明授权Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head 有权光刻胶组合物，使用光致抗蚀剂组合物和喷墨打印头形成图案的方法公开(公告)号：US08163463B2
公开(公告)日：2012-04-24
申请号：US12040009
申请日：2008-02-29
申请人： Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
发明人： Jin-baek Kim , Byung-ha Park , Kyu-sik Kim , Young-ung Ha , Su-min Kim
CPC分类号： G03F7/038 , B41J2/1603 , B41J2/1631 , B41J2/1645 , G03F7/0385 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
摘要翻译： 包含由式1或2表示的含氧杂环丁烷的化合物，由式3或4表示的含环氧乙烷的化合物，光引发剂和溶剂的光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法和喷墨印刷 头包括光致抗蚀剂组合物的聚合产物。 光致抗蚀剂组合物提供抗内壁应力形成裂纹的聚合物，耐热性优异，耐化学性优异，粘合性优异，耐久性优异。
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5.发明授权Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound 失效含有氧杂环丁烷的化合物，具有相同的光致抗蚀剂组合物，使用光致抗蚀剂组合物制备图案的方法，以及包含含氧杂环丁烷化合物的聚合产物的喷墨打印头公开(公告)号：US07524610B2
公开(公告)日：2009-04-28
申请号：US11768632
申请日：2007-06-26
申请人： Kyu-sik Kim , Jin-baek Kim , Young-ung Ha , Byung-ha Park , Ji-young Park , Su-min Kim
发明人： Kyu-sik Kim , Jin-baek Kim , Young-ung Ha , Byung-ha Park , Ji-young Park , Su-min Kim
IPC分类号： G03C1/73 , G03F7/004 , G03F7/20 , G03F7/30 , C07D305/00
CPC分类号： C07D305/06 , C08L61/06 , G03F7/038 , Y10S430/115
摘要： An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.
摘要翻译： 含有氧杂环丁烷的化合物，包含其的光致抗蚀剂组合物，使用光致抗蚀剂组合物制备图案的方法，以及包含含氧杂环丁烷化合物的聚合产物的喷墨打印头。
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