Semiconductor Device With An Image Sensor And Method For The Manufacture Of Such A Device
    2.
    发明申请
    Semiconductor Device With An Image Sensor And Method For The Manufacture Of Such A Device 有权
    具有图像传感器的半导体器件及其制造方法

    公开(公告)号:US20080197386A1

    公开(公告)日:2008-08-21

    申请号:US11912697

    申请日:2006-04-26

    IPC分类号: H01L27/146 H01L21/8238

    摘要: The invention relates to a semiconductor device with a semiconductor body (12) with an image sensor comprising a two-dimensional matrix of pixels (1) each comprising a radiation-sensitive element (2) with a charge accumulating semiconductor region (2A) and coupled to a number of MOS field effect transistors (3), in which in the semiconductor body (12) an isolation region (4) is sunken for the separation of neighboring pixels (1) underneath which a further semiconductor region (5) with an enlarged doping concentration is formed. According to the invention the further semiconductor region (5) is sunken in the surface of the semiconductor body (12) and wider than the isolation region (4). Preferably the isolation region (4) is merely located there where a radiation sensitive element (2) borders on the MOS transistors (3) of a neighboring pixel (1) and there where two neighboring pixels (1) border on each other with their radiation sensitive elements (2) another sunken semiconductor region (6) with an enlarged doping concentration is located. Such a device (10) has a low leakage current and a large radiation sensitivity and charge storage capacity.

    摘要翻译: 本发明涉及具有半导体本体(12)的半导体器件,该半导体器件(12)具有图像传感器,该图像传感器包括像素(2)的二维矩阵,每个像素阵列包括具有电荷累积半导体区域(2A)的辐射敏感元件(2) 耦合到多个MOS场效应晶体管(3),其中在半导体主体(12)中,隔离区域(4)凹陷以分离其下方的相邻像素(1),其中另外的半导体区域(5)具有 形成增大的掺杂浓度。 根据本发明,另外的半导体区域(5)在半导体本体(12)的表面凹陷并且比隔离区域(4)更宽。 优选地,隔离区域(4)仅位于辐射敏感元件(2)与相邻像素(1)的MOS晶体管(3)相邻并且其中两个相邻像素(1)以其辐射彼此相接的位置 敏感元件(2)定位了具有增大的掺杂浓度的另一凹陷半导体区域(6)。 这种装置(10)具有低泄漏电流和大的辐射灵敏度和电荷存储容量。