PALLET FOR HIGH TEMPERATURE PROCESSING
    1.
    发明申请
    PALLET FOR HIGH TEMPERATURE PROCESSING 审中-公开
    高温加工用托盘

    公开(公告)号:US20120121816A1

    公开(公告)日:2012-05-17

    申请号:US12954007

    申请日:2010-11-24

    IPC分类号: B65D19/38 C23C14/34

    摘要: A generally planar substrate pallet having an front, a back, and pair of sides. The distance between the front and the back and the distance between the sides are significantly longer than the thickness of the substrate pallet. The ratio of vertical deflection of the substrate pallet to the distance between the sides at temperatures used in high temperature processing systems relative to room temperature is less than 1%.

    摘要翻译: 具有前部,后部和一对侧面的大致平面的基板托盘。 前后的距离和两边之间的距离明显长于基板托盘的厚度。 在高温处理系统中使用的温度相对于室温的情况下,基板托盘的垂直偏转比与侧面之间的距离小于1%。