公开(公告)号：US07985297B2

公开(公告)日：2011-07-26

申请号：US12500141

申请日：2009-07-09

申请人： Jung-Dae Park ,  Pil-Kwon Jun ,  Bo-Yong Lee ,  Tae-Hyo Choi ,  Da-Hee Lee ,  Seung-Ki Chae

发明人： Jung-Dae Park ,  Pil-Kwon Jun ,  Bo-Yong Lee ,  Tae-Hyo Choi ,  Da-Hee Lee ,  Seung-Ki Chae

IPC分类号： H01L21/02

CPC分类号： C11D11/0052 ,  C11D7/08 ,  C11D7/28 ,  C11D7/3209

摘要： A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.

摘要翻译： 提供了石英部件的清洗液和清洗石英部件的方法。 清洗溶液包含约5至约35重量％的铵化合物，约7至约55重量％的酸性氧化剂，约5至约30重量％的氟化合物和剩余量的水。 可以除去石英部件表面上的残余薄膜和杂质，同时减少对石英部件的损伤。

公开(公告)号：US20100009883A1

公开(公告)日：2010-01-14

申请号：US12500141

申请日：2009-07-09

申请人： Jung-Dae PARK ,  Pil-Kwon Jun ,  Bo-Yong Lee ,  Tae-Hyo Choi ,  Da-Hee Lee ,  Seung-Ki Chae

发明人： Jung-Dae PARK ,  Pil-Kwon Jun ,  Bo-Yong Lee ,  Tae-Hyo Choi ,  Da-Hee Lee ,  Seung-Ki Chae

IPC分类号： C11D3/20

CPC分类号： C11D11/0052 ,  C11D7/08 ,  C11D7/28 ,  C11D7/3209

摘要： A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.

摘要翻译： 提供了石英部件的清洗液和清洗石英部件的方法。 清洗溶液包含约5至约35重量％的铵化合物，约7至约55重量％的酸性氧化剂，约5至约30重量％的氟化合物和剩余量的水。 可以除去石英部件表面上的残余薄膜和杂质，同时减少对石英部件的损伤。