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1.
公开(公告)号:US20220107458A1
公开(公告)日:2022-04-07
申请号:US17554342
申请日:2021-12-17
Applicant: Juniper Networks, Inc.
Inventor: John Parker , Gregory Alan Fish , Martin A. Spannagel , Antonio Labaro
IPC: G02B6/122 , H01L21/762 , H01L21/02 , H01L21/306 , G02B6/132 , G02B6/136
Abstract: Methods and systems are presented for heterogeneous integration of photonics and electronics with atomic layer deposition (ALD) bonding. One method includes operations for forming a compound semiconductor and for depositing (e.g., via atomic layer deposition) a continuous film of a protection material (e.g., Al2O3) on a first surface of the compound semiconductor. Further, the method includes an operation for forming a silicon on insulator (SOI) wafer, with the SOI wafer comprising one or more waveguides. The method further includes bonding the compound semiconductor at the first surface to the SOI wafer to form a bonded structure and processing the bonded structure. The protection material protects the compound semiconductor from acid etchants during further processing of the bonded structure.
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2.
公开(公告)号:US10168475B2
公开(公告)日:2019-01-01
申请号:US15408725
申请日:2017-01-18
Applicant: Juniper Networks, Inc.
Inventor: John Parker , Gregory Alan Fish , Martin A. Spannagel , Antonio Labaro
IPC: G02B6/122 , G02B6/136 , H01L21/762 , H01L21/02 , H01L21/306 , G02B6/132
Abstract: Methods and systems are presented for heterogeneous integration of photonics and electronics with atomic layer deposition (ALD) bonding. One method includes operations for forming a compound semiconductor and for depositing (e.g., via atomic layer deposition) a continuous film of a protection material (e.g., Al2O3) on a first surface of the compound semiconductor. Further, the method includes an operation for forming a silicon on insulator (SOI) wafer, with the SOI wafer comprising one or more waveguides. The method further includes bonding the compound semiconductor at the first surface to the SOI wafer to form a bonded structure and processing the bonded structure. The protection material protects the compound semiconductor from acid etchants during further processing of the bonded structure.
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3.
公开(公告)号:US11237325B2
公开(公告)日:2022-02-01
申请号:US16844492
申请日:2020-04-09
Applicant: Juniper Networks, Inc.
Inventor: John Parker , Gregory Alan Fish , Martin A. Spannagel , Antonio Labaro
IPC: G02B6/12 , H01L21/12 , G02B6/122 , H01L21/762 , H01L21/02 , H01L21/306 , G02B6/132 , G02B6/136
Abstract: Methods and systems are presented for heterogeneous integration of photonics and electronics with atomic layer deposition (ALD) bonding. One method includes operations for forming a compound semiconductor and for depositing (e.g., via atomic layer deposition) a continuous film of a protection material (e.g., Al2O3) on a first surface of the compound semiconductor. Further, the method includes an operation for forming a silicon on insulator (SOI) wafer, with the SOI wafer comprising one or more waveguides. The method further includes bonding the compound semiconductor at the first surface to the SOI wafer to form a bonded structure and processing the bonded structure. The protection material protects the compound semiconductor from acid etchants during further processing of the bonded structure.
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公开(公告)号:US20190331859A1
公开(公告)日:2019-10-31
申请号:US15967313
申请日:2018-04-30
Applicant: Juniper Networks, Inc.
Inventor: Martin A. Spannagel , Brian Robert Koch , Jared Bauters
IPC: G02B6/30
Abstract: Optical alignment of an optical connector to input/output couplers of a photonic integrated circuit can be achieved by first actively aligning the optical connector successively to two loopback alignment features formed in the photonic chip of the PIC, optically unconnected to the PIC, and then moving the optical connector, based on precise knowledge of the positions of the loopback alignment features relative to the input/output couplers of the PIC, to a position aligned with the input/output couplers of the PIC and locking it in place.
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公开(公告)号:US10809461B2
公开(公告)日:2020-10-20
申请号:US16589399
申请日:2019-10-01
Applicant: Juniper Networks, Inc.
Inventor: Martin A. Spannagel , Brian Robert Koch , Jared Bauters
Abstract: Optical alignment of an optical connector to input/output couplers of a photonic integrated circuit can be achieved by first actively aligning the optical connector successively to two loopback alignment features formed in the photonic chip of the PIC, optically unconnected to the PIC, and then moving the optical connector, based on precise knowledge of the positions of the loopback alignment features relative to the input/output couplers of the PIC, to a position aligned with the input/output couplers of the PIC and locking it in place.
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公开(公告)号:US10775564B2
公开(公告)日:2020-09-15
申请号:US16589399
申请日:2019-10-01
Applicant: Juniper Networks, Inc.
Inventor: Martin A. Spannagel , Brian Robert Koch , Jared Bauters
Abstract: Optical alignment of an optical connector to input/output couplers of a photonic integrated circuit can be achieved by first actively aligning the optical connector successively to two loopback alignment features formed in the photonic chip of the PIC, optically unconnected to the PIC, and then moving the optical connector, based on precise knowledge of the positions of the loopback alignment features relative to the input/output couplers of the PIC, to a position aligned with the input/output couplers of the PIC and locking it in place.
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7.
公开(公告)号:US20200233148A1
公开(公告)日:2020-07-23
申请号:US16844492
申请日:2020-04-09
Applicant: Juniper Networks, Inc.
Inventor: John Parker , Gregory Alan Fish , Martin A. Spannagel , Antonio Labaro
IPC: G02B6/122 , H01L21/762 , H01L21/02 , H01L21/306 , G02B6/132 , G02B6/136
Abstract: Methods and systems are presented for heterogeneous integration of photonics and electronics with atomic layer deposition (ALD) bonding. One method includes operations for forming a compound semiconductor and for depositing (e.g., via atomic layer deposition) a continuous film of a protection material (e.g., Al2O3) on a first surface of the compound semiconductor. Further, the method includes an operation for forming a silicon on insulator (SOI) wafer, with the SOI wafer comprising one or more waveguides. The method further includes bonding the compound semiconductor at the first surface to the SOI wafer to form a bonded structure and processing the bonded structure. The protection material protects the compound semiconductor from acid etchants during further processing of the bonded structure.
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公开(公告)号:US20200033538A1
公开(公告)日:2020-01-30
申请号:US16589399
申请日:2019-10-01
Applicant: Juniper Networks, Inc.
Inventor: Martin A. Spannagel , Brian Robert Koch , Jared Bauters
Abstract: Optical alignment of an optical connector to input/output couplers of a photonic integrated circuit can be achieved by first actively aligning the optical connector successively to two loopback alignment features formed in the photonic chip of the PIC, optically unconnected to the PIC, and then moving the optical connector, based on precise knowledge of the positions of the loopback alignment features relative to the input/output couplers of the PIC, to a position aligned with the input/output couplers of the PIC and locking it in place.
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公开(公告)号:US10527796B2
公开(公告)日:2020-01-07
申请号:US15967313
申请日:2018-04-30
Applicant: Juniper Networks, Inc.
Inventor: Martin A. Spannagel , Brian Robert Koch , Jared Bauters
Abstract: Optical alignment of an optical connector to input/output couplers of a photonic integrated circuit can be achieved by first actively aligning the optical connector successively to two loopback alignment features formed in the photonic chip of the PIC, optically unconnected to the PIC, and then moving the optical connector, based on precise knowledge of the positions of the loopback alignment features relative to the input/output couplers of the PIC, to a position aligned with the input/output couplers of the PIC and locking it in place.
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10.
公开(公告)号:US20190072715A1
公开(公告)日:2019-03-07
申请号:US16181868
申请日:2018-11-06
Applicant: Juniper Networks, Inc.
Inventor: John Parker , Gregory Alan Fish , Martin A. Spannagel , Antonio Labaro
IPC: G02B6/122 , G02B6/136 , G02B6/132 , H01L21/306 , H01L21/02 , H01L21/762
Abstract: Methods and systems are presented for heterogeneous integration of photonics and electronics with atomic layer deposition (ALD) bonding. One method includes operations for forming a compound semiconductor and for depositing (e.g., via atomic layer deposition) a continuous film of a protection material (e.g., Al2O3) on a first surface of the compound semiconductor. Further, the method includes an operation for forming a silicon on insulator (SOI) wafer, with the SOI wafer comprising one or more waveguides. The method further includes bonding the compound semiconductor at the first surface to the SOI wafer to form a bonded structure and processing the bonded structure. The protection material protects the compound semiconductor from acid etchants during further processing of the bonded structure.
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