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1.发明授权Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film 失效溅射靶，其制造方法，通过使用这种溅射靶形成的溅射薄膜，以及使用这种薄膜的有机EL器件公开(公告)号：US08029655B2
公开(公告)日：2011-10-04
申请号：US11996550
申请日：2006-07-03
IPC分类号： C23C14/00
CPC分类号： C23C14/3414 , C23C14/08 , H01B1/08 , H01L51/5253 , H05B33/26
摘要： Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of SiαTiβOγ wherein α, β and γ are mole ratios of Si, Ti and O, respectively, and the ratio of α/β ranges from 0.45 to 7.25 and the ratio of γ/(α+β) ranges from 0.80 to 1.70.
摘要翻译： 本发明提供能够赋予溅射膜高的阻水性和高柔性的溅射靶，能够在溅射中保持高的成膜速度，并且可能会对要形成的膜的目标物质造成损害 尽可能。 为了实现这一点，将含有20〜80重量％的SiO粉末，剩余的粉末由TiO 2粉末和/或Ti粉末制成的混合粉末进行压制和烧结。 该烧结体具有SiαTi＆bgr;Oγ的组成，其中α，bgr; 和γ分别为Si，Ti和O的摩尔比，α/ 范围为0.45〜7.25，γ/（α+和bgr）的比例范围为0.80〜1.70。
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2.发明申请SPUTTERING TARGET, METHOD FOR PRODUCING SAME, SPUTTERING THIN FILM FORMED BY USING SUCH SPUTTERING TARGET, AND ORGANIC EL DEVICE USING SUCH THIN FILM 失效溅射靶，其制造方法，使用这种溅射靶材形成的溅射薄膜以及使用这种薄膜的有机EL器件公开(公告)号：US20090127108A1
公开(公告)日：2009-05-21
申请号：US11996550
申请日：2006-07-03
CPC分类号： C23C14/3414 , C23C14/08 , H01B1/08 , H01L51/5253 , H05B33/26
摘要： Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of SiαTiβOγ wherein α, β and γ are mole ratios of Si, Ti and O, respectively, and the ratio of α/β ranges from 0.45 to 7.25 and the ratio of γ/(α+β) ranges from 0.80 to 1.70.
摘要翻译： 本发明提供能够赋予溅射膜高的阻水性和高柔性的溅射靶，能够在溅射中保持高的成膜速度，并且可能会对要形成的膜的目标物质造成损害 尽可能。 为了实现这一点，将含有20〜80重量％的SiO粉末，剩余的粉末由TiO 2粉末和/或Ti粉末制成的混合粉末进行压制并烧结。 烧结体具有SialphaTibetaOgamma的组成，其中α，β和γ分别是Si，Ti和O的摩尔比，α/β范围在0.45至7.25之间，γ/（α+β）的比例 从0.80到1.70。
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