公开(公告)号：US20040045880A1

公开(公告)日：2004-03-11

申请号：US10640039

申请日：2003-08-14

Applicant: Kabushiki Kaisha Toshiba

Inventor： Seiichi Murayama ,  Futoshi Kurokawa ,  Masao Kaneko ,  Kotaro Iyasu ,  Kenji Taguchi ,  Kie Kubo ,  Shojiro Tamaki ,  Akira Hiramoto ,  Takumi Hayashi ,  Nobuyoshi Kaiga

IPC: B01D001/00

CPC classification number: B01D61/16 ,  B01D61/145 ,  B01D61/147 ,  B01D61/22 ,  B01D2311/04 ,  C02F1/008 ,  C02F1/283 ,  C02F1/44 ,  C02F1/444 ,  C02F1/52 ,  C02F1/76 ,  C02F1/78 ,  C02F2209/001 ,  C02F2209/003 ,  C02F2209/40 ,  Y10S210/908 ,  B01D2311/16

Abstract: A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.

Abstract translation: 使用荧光分析仪的水处理控制系统包括具有活性炭注入器4a的活性炭注入装置4，设置在活性炭注入器4a的上游的荧光分析装置7和流水量计6.活性炭注入率 通过活性炭注入速率计算装置8，根据来自荧光分析装置7的测定值计算出降低三卤代甲烷形成电位所必需的量。来自活性炭注入器4a的活性炭注入量由活性炭注入量控制装置 基于活性炭注入率和流量水流量计6的测定值。

公开(公告)号：US20040045886A1

公开(公告)日：2004-03-11

申请号：US10644015

申请日：2003-08-20

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Norimitsu Abe ,  Setsuo Suzuki ,  Seiichi Murayama ,  Kotaro Iyasu ,  Kie Kubo ,  Kenji Taguchi

IPC: B01J020/00

CPC classification number: C02F1/325 ,  C02F1/722 ,  C02F1/78 ,  C02F2201/3227 ,  C02F2201/326 ,  C02F2201/782 ,  C02F2201/784 ,  C02F2209/001 ,  C02F2209/005 ,  C02F2209/08 ,  C02F2209/20 ,  C02F2209/40

Abstract: A UV-assisted advanced-ozonation water treatment system comprises a water treating tank 1, an ozonic water tank 2, an ozonized gas generator 3, and a UV light source 4 disposed in the water treating tank 1 and having a UV-radiating surface 4a, and an ozonic water jetting device including jetting nozzles 5 for jetting the ozonic water onto the UV-radiating surface of the UV light source. An ozonized gas diffusing device 12 is placed in the ozonic water tank 2. An ozonized gas generated by the ozonized gas generator 3 and compressed by a compressor 13 at a pressure in the range of about 2 to about 3 kg/cm2 is diffused into the ozonic water tank 2 by the ozonized gas diffusing device 12. A high-pressure, a high-ozone-concentration ozonic water produced in the ozonized water tank 2 is jetted through the jetting nozzles 5 onto the UV-radiating surface 4a.

Abstract translation: 紫外线辅助先进臭氧化水处理系统包括设置在水处理槽1中的水处理槽1，臭氧水箱2，臭氧化气体发生器3和UV光源4，并具有UV辐射表面4a 以及包括用于将臭氧水喷射到UV光源的UV辐射表面上的喷射喷嘴5的臭氧水喷射装置。 将臭氧化气体扩散装置12放置在臭氧水箱2中。由臭氧化气体发生器3产生并由压缩机13在约2至约3kg / cm 2的压力下压缩的臭氧化气体为 通过臭氧化气体扩散装置12将其扩散到臭氧水箱2.将臭氧水箱2中产生的高压，高臭氧浓度的臭氧水通过喷射喷嘴5喷射到UV辐射表面4a上。