MAGNETIC MEMORY AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    MAGNETIC MEMORY AND METHOD OF MANUFACTURING THE SAME 有权
    磁记忆及其制造方法

    公开(公告)号:US20140206106A1

    公开(公告)日:2014-07-24

    申请号:US14223802

    申请日:2014-03-24

    IPC分类号: H01L43/12

    摘要: A magnetic memory according to an embodiment includes: at least one memory cell comprising a magnetoresistive element as a memory element, and first and second electrodes that energize the magnetoresistive element. The magnetoresistive element includes: a first magnetic layer having a variable magnetization direction perpendicular to a film plane; a tunnel barrier layer on the first magnetic layer; and a second magnetic layer on the tunnel barrier layer, and having a fixed magnetization direction perpendicular to the film plane. The first magnetic layer including: a first region; and a second region outside the first region so as to surround the first region, and having a smaller perpendicular magnetic anisotropy energy than that of the first region. The second magnetic layer including: a third region; and a fourth region outside the third region, and having a smaller perpendicular magnetic anisotropy energy than that of the third region.

    摘要翻译: 根据实施例的磁存储器包括:包括作为存储元件的磁阻元件的至少一个存储单元,以及激励磁阻元件的第一和第二电极。 磁阻元件包括:具有与膜平面垂直的可变磁化方向的第一磁性层; 在第一磁性层上的隧道阻挡层; 以及隧道势垒层上的第二磁性层,并且具有与膜平面垂直的固定的磁化方向。 所述第一磁性层包括:第一区域; 以及围绕第一区域的第一区域外的第二区域,并且具有比第一区域小的垂直磁各向异性能量。 第二磁性层包括:第三区域; 以及第三区域外的第四区域,并且具有比第三区域小的垂直磁各向异性能量。

    METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT
    2.
    发明申请
    METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT 审中-公开
    制造磁性元件的方法

    公开(公告)号:US20130248355A1

    公开(公告)日:2013-09-26

    申请号:US13621978

    申请日:2012-09-18

    IPC分类号: C23F1/00

    摘要: According to one embodiment, a method of manufacturing a magnetoresistive element, the method includes forming a first magnetic layer, forming a tunnel barrier layer on the first magnetic layer, forming a second magnetic layer on the tunnel barrier layer, forming a hard mask layer on the second magnetic layer, and patterning the second magnetic layer, the tunnel barrier layer, and the first magnetic layer, with a cluster ion beam using the hard mask layer as a mask, wherein the cluster ion beam comprises cluster ions, cluster sizes of the cluster ions are distributed, and a peak value of the distribution of the cluster sizes is 2 pieces or more and 1000 pieces or less.

    摘要翻译: 根据一个实施例,一种制造磁阻元件的方法,该方法包括形成第一磁性层,在第一磁性层上形成隧道势垒层,在隧道势垒层上形成第二磁性层,在第 第二磁性层,使用该硬掩模层作为掩模以簇离子束形成第二磁性层,隧道势垒层和第一磁性层,其中,簇离子束包括簇离子, 簇离子分布,簇大小分布的峰值为2片以上且1000片以下。

    Magnetic memory and method of manufacturing the same
    3.
    发明授权
    Magnetic memory and method of manufacturing the same 有权
    磁存储器及其制造方法

    公开(公告)号:US09224944B2

    公开(公告)日:2015-12-29

    申请号:US14223802

    申请日:2014-03-24

    摘要: A magnetic memory according to an embodiment includes: at least one memory cell comprising a magnetoresistive element as a memory element, and first and second electrodes that energize the magnetoresistive element. The magnetoresistive element includes: a first magnetic layer having a variable magnetization direction perpendicular to a film plane; a tunnel barrier layer on the first magnetic layer; and a second magnetic layer on the tunnel barrier layer, and having a fixed magnetization direction perpendicular to the film plane. The first magnetic layer including: a first region; and a second region outside the first region so as to surround the first region, and having a smaller perpendicular magnetic anisotropy energy than that of the first region. The second magnetic layer including: a third region; and a fourth region outside the third region, and having a smaller perpendicular magnetic anisotropy energy than that of the third region.

    摘要翻译: 根据实施例的磁存储器包括:包括作为存储元件的磁阻元件的至少一个存储单元,以及激励磁阻元件的第一和第二电极。 磁阻元件包括:具有与膜平面垂直的可变磁化方向的第一磁性层; 在第一磁性层上的隧道阻挡层; 以及隧道势垒层上的第二磁性层,并且具有与膜平面垂直的固定的磁化方向。 所述第一磁性层包括:第一区域; 以及围绕第一区域的第一区域外的第二区域,并且具有比第一区域小的垂直磁各向异性能量。 第二磁性层包括:第三区域; 以及第三区域外的第四区域,并且具有比第三区域小的垂直磁各向异性能量。