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公开(公告)号:US12062780B1
公开(公告)日:2024-08-13
申请号:US18413239
申请日:2024-01-16
发明人: Adil Alshoaibi , Majid Khan
CPC分类号: H01M4/364 , H01M4/0404 , H01M4/0471 , H01M4/583 , H01M4/661 , H01M4/667 , H01M4/808 , H01M14/00
摘要: A process for preparing carbon spheres coated on a nickel (Ni) foam/polyethylene terephthalate (PET) substrate, as well as the use of the obtained product in the field of hydrovoltaic energy generation.
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公开(公告)号:US11898235B2
公开(公告)日:2024-02-13
申请号:US17498364
申请日:2021-10-11
发明人: Nagih Mohammed Shaalan , Faheem Ahmed , Osama Sabera , Dalia Hamad , Abdullah Aljaafari , Adil Alshoaibi
摘要: A method of forming metal nanostructures is a low temperature closed space vacuum deposition method. The method includes disposing a source material in an enclosed space at low evaporation temperatures to controllably form nanostructures of different dimensionalities on a substrate. The nanostructures have dimensionalities determined by a chosen evaporation temperature. An apparatus is also provided for performing the method.
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公开(公告)号:US11525721B1
公开(公告)日:2022-12-13
申请号:US17835934
申请日:2022-06-08
IPC分类号: G01F1/684
摘要: The microflow sensor includes a base wafer having opposed upper and lower surfaces, and a cap wafer, also having opposed upper and lower surfaces. The base wafer and the cap wafer may be formed from a semiconductor material. A flow sensing element is embedded in the upper surface of the base wafer. The flow sensing element may be any suitable type of flow sensing element, such as a central heater and at least one temperature-sensitive element. A flow channel is formed in the lower surface of the cap wafer and extends continuously between first and second longitudinally opposed edges of the cap wafer. The lower surface of the cap wafer is bonded to the upper surface of the base wafer such that fluid flowing through the flow channel passes above and across the sensing element.
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公开(公告)号:US20220316046A1
公开(公告)日:2022-10-06
申请号:US17498364
申请日:2021-10-11
发明人: Nagih Mohammed Shaalan , Faheem Ahmed , Osama Sabera , Dalia Hamad , Abdullah Aljaafari , Adil Alshoaibi
摘要: A method of forming metal nanostructures is a low temperature closed space vacuum deposition method. The method includes disposing a source material in an enclosed space at low evaporation temperatures to controllably form nanostructures of different dimensionalities on a substrate. The nanostructures have dimensionalities determined by a chosen evaporation temperature. An apparatus is also provided for performing the method.
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公开(公告)号:US11242595B1
公开(公告)日:2022-02-08
申请号:US17221786
申请日:2021-04-03
发明人: Nagih Mohammed Shaalan , Faheem Ahmed , Osama Sabera , Dalia Hamad , Abdullah Aljaafari , Adil Alshoaibi
摘要: A method of forming metal nanostructures is a low temperature closed space vacuum deposition method. The method includes disposing a source material in an enclosed space at low evaporation temperatures to controllably form nanostructures of different dimensionalities on a substrate. The nanostructures have dimensionalities determined by a chosen evaporation temperature. An apparatus is also provided for performing the method.
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