IMPRINT APPARATUS AND IMPRINT METHOD

    公开(公告)号:US20220252975A1

    公开(公告)日:2022-08-11

    申请号:US17724281

    申请日:2022-04-19

    Abstract: An imprint apparatus includes a moveable substrate support configured to hold a substrate having a transfer target material thereon, a template holder configured to hold a template in which a pattern, which is to be transferred to the transfer target material, is formed, a light source configured to emit light at different selectable intensities toward the transfer target material, and a controller. The controller includes a processing unit and a storage unit, and is configured to retrieve exposure conditions for the transfer target material and control the intensity, and timing of initiation, of the light output by the light source, based on the retrieved exposure conditions, such that the transfer target material is subjected to main curing after undergoing temporary curing.

Patent Agency Ranking