公开(公告)号：US20210294208A1

公开(公告)日：2021-09-23

申请号：US17010350

申请日：2020-09-02

Applicant: KIOXIA CORPORATION

Inventor： Anupam MITRA ,  Masaki MITSUYASU ,  Kazuya FUKUHARA ,  Kazuhiro TAKAHATA ,  Sachiko KOBAYASHI

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00 ,  B29C59/02 ,  B29C35/08

Abstract: According to one embodiment, an imprint lithography template comprises a substrate transparent to ultraviolet light. A first mesa region is on the substrate. A surface of the first mesa region includes a pattern region to be pressed into a photocurable resist film. The pattern region having four sides. A second mesa region is also on the substrate. The first mesa region protrudes from a surface of the second mesa region. A blocking film is adjacent to two sides of the four sides pattern region. The two sides to which the blocking film is adjacent are connected to each other at a corner of the pattern region. The blocking film blocks ultraviolet light.

公开(公告)号：US20240201606A1

公开(公告)日：2024-06-20

申请号：US18456639

申请日：2023-08-28

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Anupam MITRA ,  Ryo OGAWA

IPC: G03F9/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G03F9/7042 ,  G03F7/2012 ,  G03F7/70708

Abstract: An imprint apparatus includes: a chuck including a temperature controller configured to adjust a temperature of a substrate having a shot region, the chuck configured to hold the substrate; a template stage configured to hold a template so that a surface of the template with a pattern faces the substrate and configured to change a relative position of the substrate to the template in a vertical direction; and a controller configured to control the chuck and the template stage. The controller is configured to control the temperature controller such that the temperature of the substrate is adjusted based on a magnification error between the pattern and the shot region. The controller controls the template stage such that the pattern is transferred to the shot region of the substrate of which the temperature is adjusted.

公开(公告)号：US20220252975A1

公开(公告)日：2022-08-11

申请号：US17724281

申请日：2022-04-19

Applicant: KIOXIA CORPORATION

Inventor： Kazuya FUKUHARA ,  Masaki MITSUYASU ,  Masato SUZUKI ,  Takuya KONO ,  Tetsuro NAKASUGI

IPC: G03F7/00

Abstract: An imprint apparatus includes a moveable substrate support configured to hold a substrate having a transfer target material thereon, a template holder configured to hold a template in which a pattern, which is to be transferred to the transfer target material, is formed, a light source configured to emit light at different selectable intensities toward the transfer target material, and a controller. The controller includes a processing unit and a storage unit, and is configured to retrieve exposure conditions for the transfer target material and control the intensity, and timing of initiation, of the light output by the light source, based on the retrieved exposure conditions, such that the transfer target material is subjected to main curing after undergoing temporary curing.

公开(公告)号：US20240094624A1

公开(公告)日：2024-03-21

申请号：US18457983

申请日：2023-08-29

Applicant: Kioxia Corporation

Inventor： Masaki MITSUYASU ,  Ryo OGAWA ,  Anupam MITRA

IPC: G03F1/42 ,  G03F7/00 ,  G03F9/00 ,  H01L21/3213

CPC classification number: G03F1/42 ,  G03F7/0002 ,  G03F9/7073 ,  H01L21/32139

Abstract: According to one embodiment, a pattern formation method includes holding a substrate on a suction chuck that an outer suction region for an outer edge portion of the substrate and an inner suction region for an inner region of the substrate. A partial shot region at an outer edge of the substrate has a first alignment mark in the inner region and a second alignment mark at the outer edge portion. While a template is being pressed against a resin film in the shot region, position alignment using the second and fourth alignment marks is performed by adjusting a suction force for the outer suction region for changing a warpage amount of the substrate while observing the second and fourth alignment marks through the template.

公开(公告)号：US20210072638A1

公开(公告)日：2021-03-11

申请号：US16807606

申请日：2020-03-03

Applicant: KIOXIA CORPORATION

Inventor： Masaki MITSUYASU ,  Kazuya FUKUHARA

IPC: G03F7/00 ,  H01L21/027

Abstract: An imprinting method includes placing a template onto non-solidified resin that is applied onto a surface of a substrate, such that the non-solidified resin extends into a pattern of the template in a surface direction of the substrate, starting first alignment operation to align the template with the substrate using a first alignment mark at a first timing, and starting a second alignment operation to align the template with the substrate using a second alignment mark at a second timing after the first timing. The first timing is when the non-solidified resin has extended into the first alignment mark and not yet into the second alignment mark. The second timing is when the non-solidified resin has extended into the first and second alignment marks.