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公开(公告)号:US20230246015A1
公开(公告)日:2023-08-03
申请号:US18297849
申请日:2023-04-10
Applicant: KIOXIA CORPORATION
Inventor: Jun IIJIMA , Yumi NAKAJIMA
IPC: H01L25/18 , H01L25/065 , H01L25/00 , H01L23/00
CPC classification number: H01L25/18 , H01L24/08 , H01L24/80 , H01L25/50 , H01L25/0657 , H01L2224/08145 , H01L2224/80894 , H01L2225/06524 , H01L2924/1431 , H01L2924/14511
Abstract: In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a second direction, and a second curved portion curved with respect to the second extending portion. The device further includes a first plug provided on the first curved portion, or on a first non-opposite portion included in the first extending portion and not opposite to the second extending portion in the second direction. The device further includes a second plug provided on the second curved portion, or on a second non-opposite portion included in the second extending portion and not opposite to the first extending portion in the second direction.
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公开(公告)号:US20210091112A1
公开(公告)日:2021-03-25
申请号:US17010451
申请日:2020-09-02
Applicant: Kioxia Corporation
Inventor: Yumi NAKAJIMA , Satoshi NAGASHIMA
IPC: H01L27/11582 , H01L27/11519 , H01L27/11524 , H01L27/11556 , H01L27/11565 , H01L27/1157 , H01L23/544
Abstract: According to one embodiment, a semiconductor device comprising: a first stacked structure in which first insulating layers and first conductive layers are alternately stacked; a second stacked structure in which second insulating layers and second conductive layers are alternately stacked; a first memory pillar provided in the first stacked structure; a first dividing structure dividing the first conductive layers; a second memory pillar provided within the second stacked structure and connected to the first memory pillar; a second dividing structure dividing the second conductive layers; a first alignment mark pillar provided in the first stacked structure and projecting from the first stacked structure; a second alignment mark pillar provided on the first alignment mark pillar; an alignment mark surrounded by the second alignment mark pillar.
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公开(公告)号:US20210082946A1
公开(公告)日:2021-03-18
申请号:US16782697
申请日:2020-02-05
Applicant: KIOXIA CORPORATION
Inventor: Yumi NAKAJIMA
IPC: H01L27/11582 , H01L23/528 , H01L23/522 , H01L27/11556
Abstract: According to one embodiment, a semiconductor memory device includes a via provided above a substrate, a conductive layer provided on the via, and a via provided on the conductive layer. The via, the conductive layer, and the via are one continuous structure.
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公开(公告)号:US20220199603A1
公开(公告)日:2022-06-23
申请号:US17692954
申请日:2022-03-11
Applicant: KIOXIA CORPORATION
Inventor: Jun IIJIMA , Yumi NAKAJIMA
IPC: H01L25/18 , H01L25/065 , H01L25/00 , H01L23/00
Abstract: In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a second direction, and a second curved portion curved with respect to the second extending portion. The device further includes a first plug provided on the first curved portion, or on a first non-opposite portion included in the first extending portion and not opposite to the second extending portion in the second direction. The device further includes a second plug provided on the second curved portion, or on a second non-opposite portion included in the second extending portion and not opposite to the first extending portion in the second direction.
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