SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230246015A1

    公开(公告)日:2023-08-03

    申请号:US18297849

    申请日:2023-04-10

    Abstract: In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a second direction, and a second curved portion curved with respect to the second extending portion. The device further includes a first plug provided on the first curved portion, or on a first non-opposite portion included in the first extending portion and not opposite to the second extending portion in the second direction. The device further includes a second plug provided on the second curved portion, or on a second non-opposite portion included in the second extending portion and not opposite to the first extending portion in the second direction.

    SEMICONDUCTOR DEVICE
    2.
    发明申请

    公开(公告)号:US20210091112A1

    公开(公告)日:2021-03-25

    申请号:US17010451

    申请日:2020-09-02

    Abstract: According to one embodiment, a semiconductor device comprising: a first stacked structure in which first insulating layers and first conductive layers are alternately stacked; a second stacked structure in which second insulating layers and second conductive layers are alternately stacked; a first memory pillar provided in the first stacked structure; a first dividing structure dividing the first conductive layers; a second memory pillar provided within the second stacked structure and connected to the first memory pillar; a second dividing structure dividing the second conductive layers; a first alignment mark pillar provided in the first stacked structure and projecting from the first stacked structure; a second alignment mark pillar provided on the first alignment mark pillar; an alignment mark surrounded by the second alignment mark pillar.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220199603A1

    公开(公告)日:2022-06-23

    申请号:US17692954

    申请日:2022-03-11

    Abstract: In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a second direction, and a second curved portion curved with respect to the second extending portion. The device further includes a first plug provided on the first curved portion, or on a first non-opposite portion included in the first extending portion and not opposite to the second extending portion in the second direction. The device further includes a second plug provided on the second curved portion, or on a second non-opposite portion included in the second extending portion and not opposite to the first extending portion in the second direction.

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