公开(公告)号：US20250095317A1

公开(公告)日：2025-03-20

申请号：US18797300

申请日：2024-08-07

Applicant: KLA Corporation

Inventor： Gordon Rouse ,  Srivathsan Krishnamohan

IPC: G06V10/22 ,  G06T7/00

Abstract: Methods and systems for determining information for an area having unknown patterns and unknown pattern repeatability are provided. One or more computer systems of the system are configured for detecting first and second polygons in first and second rows, respectively, in a design for a specimen. The first and second rows have first dimensions perpendicular to an edge of a known area in the design from inner boundaries of the rows to outer boundaries of the rows. The computer system(s) are also configured for determining first and second repeating pitches of the first and second polygons, respectively. When the first and second repeating pitches are different from each other, the computer system(s) are configured for determining an outer boundary of the area having the unknown patterns and the unknown pattern repeatability as the outer boundary of the first row.

公开(公告)号：US20210158223A1

公开(公告)日：2021-05-27

申请号：US17098256

申请日：2020-11-13

Applicant: KLA Corporation

Inventor： Abdurrahman Sezginer ,  Gordon Rouse ,  Manikandan Mariyappan

IPC: G06N20/10 ,  G01N21/956 ,  G01N21/95

Abstract: Context attributes for optical imaging of a patterned layer of a semiconductor die are calculated. Calculating the context attributes includes calculating convolutions of a pattern of the patterned layer with respective kernels of a plurality of kernels, wherein the plurality of kernels is orthogonal. Defects on the semiconductor die are found in accordance with the context attributes.