公开(公告)号：US20210149315A1

公开(公告)日：2021-05-20

申请号：US17099632

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Matthew Derstine ,  John Savee ,  Evgeniia Butaeva ,  Serguei Likhanski ,  Gildardo Delgado

IPC: G03F7/20

Abstract: A system for mitigating damage to optical elements caused by vacuum ultraviolet (VUV) light exposure is disclosed. The system includes a light source configured to generate VUV and a chamber containing one or more gaseous fluorine-based compounds of a selected partial pressure. The system includes one or more optical elements. The one or more optical elements are located within the chamber and are exposed to the one or more gaseous fluorine-based compounds. The VUV light generated by the light source is of sufficient energy to dissociate the fluorine-based compound within the chamber into a primary product.

公开(公告)号：US11262664B2

公开(公告)日：2022-03-01

申请号：US17099632

申请日：2020-11-16

Applicant: KLA Corporation

Inventor： Matthew Derstine ,  John Savee ,  Evgeniia Butaeva ,  Serguei Likhanski ,  Gildardo Delgado

IPC: C01B7/01 ,  G03F7/20

Abstract: A system for mitigating damage to optical elements caused by vacuum ultraviolet (VUV) light exposure is disclosed. The system includes a light source configured to generate VUV and a chamber containing one or more gaseous fluorine-based compounds of a selected partial pressure. The system includes one or more optical elements. The one or more optical elements are located within the chamber and are exposed to the one or more gaseous fluorine-based compounds. The VUV light generated by the light source is of sufficient energy to dissociate the fluorine-based compound within the chamber into a primary product.