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公开(公告)号:US20240193798A1
公开(公告)日:2024-06-13
申请号:US18078980
申请日:2022-12-11
Applicant: KLA Corporation
Inventor: Jun Jiang , Huan Jin , Zhifeng Huang , Wei Si , Xiaochun Li
CPC classification number: G06T7/344 , G06T7/001 , G06T11/00 , G06T2207/30148 , G06T2207/30168
Abstract: Methods and systems for determining information for a specimen are provided. One system includes a model configured for generating a rendered image for an alignment target on a specimen from information for a design of the alignment target. The rendered image is a simulation of images of the alignment target on the specimen generated by an imaging subsystem. The system also includes a computer subsystem configured for modifying parameter(s) of the model based on variation in parameter(s) of the imaging subsystem and/or variation in process condition(s) used to fabricate the specimen. Subsequent to the modifying, the computer subsystem is configured for 10 generating an additional rendered image for the alignment target by inputting the information for the design of the alignment target into the model and aligning the additional rendered image to an image of the alignment target generated by the imaging subsystem.
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公开(公告)号:US11803960B2
公开(公告)日:2023-10-31
申请号:US17355126
申请日:2021-06-22
Applicant: KLA Corporation
Inventor: Huan Jin , Xiaochun Li , Sangbong Park , Zhifeng Huang
CPC classification number: G06T7/001 , H01L22/12 , G06T2207/30148 , G06T2207/30168
Abstract: Global and local alignment energies are used in an image contrast metric. The image contrast metric can be used to find optical targets. Some pixels from a gradient magnitude image and a context range image from an optical image can be used to determine the image contrast metric. A heatmap from the image contrast metrics across part of a wafer can then be used to make a list of targets. Upper and lower confidence values can be applied to rank the available targets.
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