公开(公告)号：US20190049858A1

公开(公告)日：2019-02-14

申请号：US15763662

申请日：2018-02-27

Applicant: KLA-TENCOR CORPORATION

Inventor： Evgeni GUREVICH ,  Michael E. ADEL ,  Roel GRONHEID ,  Yoel FELER ,  Vladimir LEVINSKI ,  Dana KLEIN ,  Sharon AHARON

IPC: G03F7/20

Abstract: Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER). Minimal required dimensions of target elements may be derived from analysis of the line properties and uncertainty error of metrology measurements, by either CDSEM (critical dimension scanning electron microscopy) or optical systems, with corresponding targets. The importance of this analysis is emphasized in view of the finding that stochastic noise may have increased importance with when using more localized models such as CPE (correctables per exposure). The uncertainty error estimation may be used for target design, enhancement of overlay estimation and evaluation of measurement reliability in multiple contexts.