DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY DATA

    公开(公告)号:US20190049858A1

    公开(公告)日:2019-02-14

    申请号:US15763662

    申请日:2018-02-27

    Abstract: Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER). Minimal required dimensions of target elements may be derived from analysis of the line properties and uncertainty error of metrology measurements, by either CDSEM (critical dimension scanning electron microscopy) or optical systems, with corresponding targets. The importance of this analysis is emphasized in view of the finding that stochastic noise may have increased importance with when using more localized models such as CPE (correctables per exposure). The uncertainty error estimation may be used for target design, enhancement of overlay estimation and evaluation of measurement reliability in multiple contexts.

    ON-PRODUCT DERIVATION AND ADJUSTMENT OF EXPOSURE PARAMETERS IN A DIRECTED SELF-ASSEMBLY PROCESS
    2.
    发明申请
    ON-PRODUCT DERIVATION AND ADJUSTMENT OF EXPOSURE PARAMETERS IN A DIRECTED SELF-ASSEMBLY PROCESS 有权
    产品衍生和调整自动组装过程中的曝光参数

    公开(公告)号:US20150301514A1

    公开(公告)日:2015-10-22

    申请号:US14755758

    申请日:2015-06-30

    Abstract: Methods and metrology tool modules embodying the methods are provided. Methods comprise measuring characteristics of intermediate features such as guiding lines in a directed self-assembly (DSA) process, deriving exposure parameters from the measured characteristics; and adjusting production parameters for producing consecutive target features according to the derived exposure parameters. The methods and modules enhance the accuracy of the DSA-produced structures and related measurements.

    Abstract translation: 提供了体现方法的方法和计量工具模块。 方法包括测量中间特征的特征,例如在定向自组装(DSA)过程中的引导线,从测量的特征导出曝光参数; 并根据导出的曝光参数调整生产连续目标特征的生产参数。 这些方法和模块提高了DSA生产的结构和相关测量的准确性。

Patent Agency Ranking