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公开(公告)号:US20150309402A1
公开(公告)日:2015-10-29
申请号:US14795549
申请日:2015-07-09
Applicant: KLA-Tencor Corporation
Inventor: Vladimir LEVINSKI , Feler YOEL , Daniel KANDEL
CPC classification number: G03F1/42 , G03F7/70625 , G03F7/70641 , G03F7/70683 , G06F17/5072 , H01L22/30
Abstract: Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.
Abstract translation: 提供了计量目标,目标设计方法和计量方法。 计量目标包括属于两个或更多目标元素类型的目标元素。 每个目标元素类型包括将指定的生产参数偏移到指定范围的未解决的特征,从而为诸如焦点和剂量的过程参数提供灵敏度监控和优化工具。