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公开(公告)号：US20240345470A1
公开(公告)日：2024-10-17
申请号：US18753927
申请日：2024-06-25
Inventor： Jie LEI , Qitao ZHENG , Zouming XU , Xintao WU , Chunjian LIU , Jian TIAN
CPC classification number: G03F1/42 , G03F7/0007 , G03F7/203 , G03F7/22 , G03F7/70466 , G06F3/0446 , G06F2203/04112
Abstract: A touch panel includes a substrate, a touch driving electrode disposed on the substrate, and a touch sensing electrode disposed on the substrate, at least one of the touch driving electrode and the touch sensing electrode has a metal mesh-like structure including nodes, each node includes a first protruding structure and a second protruding structure distributed on both sides of a mesh bar, and the first protruding structure and the second protruding structure are arranged in a staggered manner along an extension direction of the mesh bar. The mesh-like structure includes a first mesh bar and a second mesh bar directly connected to both ends of the node respectively, and a center line of the first mesh bar does not coincide with a center line of the second mesh bar.
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公开(公告)号：US12078922B2
公开(公告)日：2024-09-03
申请号：US17472387
申请日：2021-09-10
Applicant: Kioxia Corporation
Inventor： Takashi Sato , Takeshi Suto , Satoshi Mitsugi
IPC: G03F1/42 , G01B11/27 , G03F7/00 , G03F9/00 , H01L23/544
CPC classification number: G03F1/42 , G01B11/27 , G03F7/0002 , G03F9/7042 , H01L23/544 , H01L2223/54426 , H01L2223/54466
Abstract: A template of one embodiment includes an alignment mark. The alignment mark includes a first main pattern and a first auxiliary pattern. In the first main pattern, a first part and a second part are disposed according to a predetermined repeating pattern. The first auxiliary pattern is configured as a pattern opposite to the repeating pattern in a region outside an end of the first main pattern.
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公开(公告)号：US12050397B2
公开(公告)日：2024-07-30
申请号：US17421702
申请日：2021-03-15
Inventor： Jie Lei , Qitao Zheng , Zouming Xu , Xintao Wu , Chunjian Liu , Jian Tian
CPC classification number: G03F1/42 , G03F7/0007 , G03F7/203 , G03F7/22 , G03F7/70466 , G06F3/0446 , G06F2203/04112
Abstract: A mask includes a first region and a second region. The first region includes a first light-shielding strip and a second light-shielding strip, the second region includes a third light-shielding strip, the first light-shielding strip, the second light-shielding strip is located between the first light-shielding strip and the third light-shielding strip, the first light-shielding strip, the second light-shielding strip and the third light-shielding strip are configured to shield light and bound spaces, and the spaces are configured in such a manner that light is allowed to pass through the spaces. A width of the first light-shielding strip in a first direction is larger than a width of the second light-shielding strip in the first direction, and the width of the second light-shielding strip in the first direction is larger than a width of the third light-shielding strip in the first direction.
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公开(公告)号：US20240219848A1
公开(公告)日：2024-07-04
申请号：US18519497
申请日：2023-11-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sanghwan LEE , Dohyung KIM , Jinhong PARK , Hachul SHIN , Seongchul HONG
CPC classification number: G03F7/7085 , G03F1/42 , G03F7/70175 , G03F7/702 , G03F7/70558 , G03F7/70716
Abstract: A mask stage, including a body, a support on a lower surface of the body including an attachable extreme ultraviolet mask, a fiducial mark on the lower surface of the body and spaced apart from the support, and a sensor area including a plurality of measurement sensors configured to measure an energy of a portion of extreme ultraviolet light incident on the body, wherein the sensor area is on the lower surface of the body and is spaced apart from the support in a scan direction of the extreme ultraviolet light, and the plurality of measurement sensors are spaced apart from one another in a direction perpendicular to the scan direction.
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公开(公告)号：US12007691B2
公开(公告)日：2024-06-11
申请号：US17855591
申请日：2022-06-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Min-Cheng Wu , Chi-Hung Liao
CPC classification number: G03F7/2022 , G03F1/42 , G03F7/2004 , G03F7/70625 , G03F7/7085 , G03F9/7065
Abstract: Embodiments of the present disclosure provide a substrate measuring device in a lithography projection apparatus that provides multiple light sources having different wavelengths. In some embodiments, a lithography projection apparatus includes a substrate measuring system disposed proximate to a substrate stage, the substrate measuring system further including an emitter including multiple light sources configured to provide multiple beams of light, each of at least some of the multiple beams of light having a different wavelength, at least one optical fiber, wherein each of respective portions of the at least one optical fiber is configured to pass a respective one of the multiple beams of light, and a receiver positioned to collected light emitted from the emitter and reflected off of a substrate disposed on the substrate stage.
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Patent Agency Ranking
公开(公告)号：US12007686B2
公开(公告)日：2024-06-11
申请号：US17313928
申请日：2021-05-06
Applicant: Applied Materials, Inc.
Inventor： Michael N. Grimbergen , Khiem K. Nguyen
CPC classification number: G03F1/80 , G03F1/22 , G03F1/36 , G03F1/42 , H01J37/32935 , H01J37/32963 , H01J37/3299 , H01L21/67069 , H01L21/67253 , H01L22/12 , H01L22/26
Abstract: Embodiments include wafer and photomask processing equipment. An etch processing system including an endpoint detection system having a light source and a photodetector is described. In an example, the light source emits light toward an alignment region over a substrate support member of an etch chamber, and the photodetector receives a reflection of the light from the alignment region. The reflection is monitored for endpoint and process control. A second light source emits light toward the alignment region, and a camera receives the light to image the alignment region. The image can be used to align the light emitted by the endpoint detection system to a spot location within the alignment region, e.g., within an alignment opening of a substrate mounted on the substrate support member.
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公开(公告)号：US20240094625A1
公开(公告)日：2024-03-21
申请号：US18522942
申请日：2023-11-29
Inventor： Hsin-Chang LEE , Ping-Hsun LIN , Chih-Cheng LIN , Chia-Jen CHEN
Abstract: A method of making a semiconductor device includes forming at least one fiducial mark on a photomask. The method further includes defining a pattern including a plurality of sub-patterns on the photomask in a pattern region. The defining the pattern includes defining a first sub-pattern of the plurality of sub-patterns having a first spacing from a second sub-pattern of the plurality of sub-patterns, wherein the first spacing is different from a second spacing between the second sub-pattern and a third sub-pattern of the plurality of sub-patterns.
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8.发明公开公开(公告)号：US20240094624A1
公开(公告)日：2024-03-21
申请号：US18457983
申请日：2023-08-29
Applicant: Kioxia Corporation
Inventor： Masaki MITSUYASU , Ryo OGAWA , Anupam MITRA
IPC: G03F1/42 , G03F7/00 , G03F9/00 , H01L21/3213
CPC classification number: G03F1/42 , G03F7/0002 , G03F9/7073 , H01L21/32139
Abstract: According to one embodiment, a pattern formation method includes holding a substrate on a suction chuck that an outer suction region for an outer edge portion of the substrate and an inner suction region for an inner region of the substrate. A partial shot region at an outer edge of the substrate has a first alignment mark in the inner region and a second alignment mark at the outer edge portion. While a template is being pressed against a resin film in the shot region, position alignment using the second and fourth alignment marks is performed by adjusting a suction force for the outer suction region for changing a warpage amount of the substrate while observing the second and fourth alignment marks through the template.
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9.发明公开公开(公告)号：US20240085778A1
公开(公告)日：2024-03-14
申请号：US18318042
申请日：2023-05-16
Applicant: Samsung Electronics Co., Ltd.
Inventor： Byungje Jung
Abstract: A photomask includes at least one line pattern monitoring mark having unit blocks that include design line patterns. Each of the unit blocks includes three design line patterns sequentially offset in a second direction perpendicular to the first direction, the unit blocks include a first unit block and a second unit block adjacent to the first unit block, the second unit block is offset from the first unit block by a rounding length in the second direction and is spaced apart from the first unit block in the first direction. In a method of manufacturing an integrated circuit device, monitoring line patterns are formed using the photomask, and a line end profile error in the monitoring line patterns is determined based on a cross-sectional structure of the monitoring line patterns taken along a line extending through at least a portion of the monitoring line patterns in the first direction.
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10.发明公开公开(公告)号：US20240085776A1
公开(公告)日：2024-03-14
申请号：US18263105
申请日：2022-03-31
Applicant: TECHNOLOGIES DIGITHO INC.
Inventor： Richard BEAUDRY
IPC: G03F7/00 , G01B9/02001 , G03F1/42
CPC classification number: G03F7/70991 , G01B9/0201 , G03F1/42 , G03F7/70291 , G01B2290/25
Abstract: A photolithography mask (10) is provided, said photolithography mask (10) including a plate (15) or an empty frame matrix, a surface of the plate (15) or empty frame matrix including an array of micro-pixels (20), wherein each micro-pixel (20) is independently controllable using an on-board micro-controller (25) in such a manner that a pattern can be generated with the array of micro-pixels (20).
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