Method, Apparatus and System for Generating Multiple Spatially Separated Inspection Regions on a Substrate
    1.
    发明申请
    Method, Apparatus and System for Generating Multiple Spatially Separated Inspection Regions on a Substrate 有权
    用于在基板上产生多个空间分离检查区域的方法,装置和系统

    公开(公告)号:US20150377794A1

    公开(公告)日:2015-12-31

    申请号:US14314727

    申请日:2014-06-25

    Inventor: Jeremy Nesbitt

    Abstract: Inspection with multiple illumination regions includes generating a primary beam of illumination directed along a primary illumination direction, transmitting a portion of the primary beam of illumination along a first illumination direction, deflecting a portion of the primary beam of illumination along a second illumination direction different from the first illumination direction with one or more angular selection elements, focusing the transmitted portion of the primary beam of illumination onto a first inspection region of the substrate, and focusing the deflected portion of the primary beam of illumination onto a second inspection region of the substrate being spatially separated from the first inspection region.

    Abstract translation: 具有多个照明区域的检查包括产生沿主要照明方向引导的一次照明光束,沿着第一照明方向传输一次照明光束的一部分,沿着与第一照明方向不同的第二照明方向偏转一次照明光束的一部分 具有一个或多个角度选择元件的第一照明方向,将所述主要照明光束的透射部分聚焦到所述基底的第一检查区域上,并且将所述主光束的偏转部分聚焦到所述基底的第二检查区域 在空间上与第一检查区域分离。

    Filter Assembly for Providing Adjustable Spectral Capabilities in a Broadband Inspection System

    公开(公告)号:US20180299324A1

    公开(公告)日:2018-10-18

    申请号:US15649388

    申请日:2017-07-13

    Abstract: A system which may be used to which may be used to increase the number of available spectrum bands in an inspection system is provided. The system may include an illumination source configured to emit broadband illumination. The system may also include a filter assembly including two or more filter units. The two or more filter units may include two or more filters with one or more varying filtering characteristics. The system may also include two or more motors configured to selectively actuate selected filters of the filter units into the beam of illumination. Using the system, the number of available spectrum bands to be used in an inspection system may be increased.

    Imaging Performance Optimization Methods for Semiconductor Wafer Inspection
    4.
    发明申请
    Imaging Performance Optimization Methods for Semiconductor Wafer Inspection 审中-公开
    半导体晶圆检测成像性能优化方法

    公开(公告)号:US20170061597A1

    公开(公告)日:2017-03-02

    申请号:US15207364

    申请日:2016-07-11

    Abstract: Inspection systems and methods for adjusting/optimizing imaging performances of the inspection systems are disclosed. An inspection system may include an optical component configured to deliver inspection light to a subject and a detector configured to obtain an image of the subject at least partially based on the inspection light delivered to the subject. The inspection system may also include a processor in communication with the optical component and the detector. The processor may be configured to: measure an aberration of the optical component based on the image of the subject obtained by the detector; and adjust the optical component to compensate for a change in the aberration.

    Abstract translation: 公开了用于调整/优化检查系统的成像性能的检查系统和方法。 检查系统可以包括被配置为向被检体传送检查光的光学部件和被配置为至少部分地基于传送到被检体的检查光获得被检体的图像的检测器。 检查系统还可以包括与光学部件和检测器通信的处理器。 处理器可以被配置为:基于由检测器获得的对象的图像来测量光学部件的像差; 并调整光学部件以补偿像差的变化。

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