公开(公告)号：US10338002B1

公开(公告)日：2019-07-02

申请号：US15411719

申请日：2017-01-20

申请人： KLA-Tencor Corporation

发明人： Robert M. Danen ,  Shuo Sun ,  Thomas Boatwright

IPC分类号： H01L21/00 ,  G01N21/88 ,  G01N21/95 ,  G06T7/00 ,  H01L21/66

摘要： Methods and systems for selecting optical modes suitable for defect inspection are disclosed. A method may include: scanning a full-stack wafer of the particular type utilizing a set of optical modes to obtain a set of full-stack wafer images; and de-processing the full-stack wafer to produce a de-processed wafer based on a location of a potential defect of interest indicated by the set of full-stack wafer images to facilitate selection of optical modes suitable for defect inspection of wafers of the particular type.