公开(公告)号：US10401305B2

公开(公告)日：2019-09-03

申请号：US13757103

申请日：2013-02-01

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Rui-fang Shi ,  Thomas Vavul

IPC: G03F1/84 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20

Abstract: An optical reticle inspection tool is used during a first inspection to obtain, for each set of one or more patch areas of the reticle, a reference average of multiple reference intensity values corresponding to light measured from sub-areas of each patch area. After using the reticle in photolithography processes, the optical reticle inspection tool is used during a second inspection to obtain, for each set of one or more patch areas, an average of multiple test intensity values corresponding to light measured from the sub-areas. The first and second inspections use the same tool setup recipe. A difference intensity map is generated, and such map comprises map values that each corresponds to a difference between each average of the test and reference intensity values for each set of one or more patches. The difference intensity map indicates whether the reticle has degraded over time more than a predefined level.

公开(公告)号：US20130211736A1

公开(公告)日：2013-08-15

申请号：US13757103

申请日：2013-02-01

Applicant: KLA-Tencor Corporation

Inventor： Carl E. Hess ,  Rui-fang Shi ,  Thomas Vavul

IPC: G01N21/95

CPC classification number: G01N21/95 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/705 ,  G03F7/7065

Abstract: An optical reticle inspection tool is used during a first inspection to obtain, for each set of one or more patch areas of the reticle, a reference average of multiple reference intensity values corresponding to light measured from sub-areas of each patch area. After using the reticle in photolithography processes, the optical reticle inspection tool is used during a second inspection to obtain, for each set of one or more patch areas, an average of multiple test intensity values corresponding to light measured from the of sub-areas. The first and second inspections use the same tool setup recipe. A difference intensity map is generated, and such map comprises map values that each corresponds to a difference between each average of the test and reference intensity values for each set of one or more patches. The difference intensity map indicates whether the reticle has degraded over time more than a predefined level.

Abstract translation: 在第一次检查期间使用光学掩模版检查工具，对于每个掩模版的一个或多个贴片区域，获得对应于从每个贴片区域的子区域测量的光的多个基准亮度值的参考平均值。 在光刻工艺中使用掩模版之后，在第二次检查期间使用光学掩模版检查工具，对于每个一个或多个贴片区域，获得对应于从子区域测量的光的多个测试强度值的平均值。 第一次和第二次检查使用相同的工具设置配方。 生成差分强度图，并且这样的图包括映射值，每个映射值对应于每个一个或多个补丁集合的每个测试平均值和参考强度值之间的差值。 差分强度图表示在超过预定义水平的时间内光罩是否已经劣化。