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公开(公告)号:US09897433B2
公开(公告)日:2018-02-20
申请号:US14980215
申请日:2015-12-28
发明人: Helen Liu , Xuan Zhao , Xiaowei Li
CPC分类号: G01B9/02083 , G01B9/02078 , G01B9/02088 , G01B11/0608 , G01B11/2441 , G01B2210/56
摘要: A wafer metrology system includes an interferometer sub-system and a controller. The interferometer sub-system is configured to generate an interferogram with an intensity map that corresponds to a modulated representation of a wafer surface. Further, the interferometer sub-system includes a detector configured to capture the interferogram. The controller includes one or more processors configured to generate a wrapped phase map of the interferogram, define patterns associated with features on the wafer, and correct phase discontinuities by applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map and correcting phase discontinuities in the unwrapped phase map based on the patterns, or by combining phase unwrapping and correction in a unified step. Further, the patterns comprise two or more structures such that a portion of the unwrapped phase map associated with structures of the same type is continuous across borders separating structures of the same type.
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公开(公告)号:US20170241764A1
公开(公告)日:2017-08-24
申请号:US14980215
申请日:2015-12-28
发明人: Helen Liu , Xuan Zhao , Xiaowei Li
CPC分类号: G01B9/02083 , G01B9/02078 , G01B9/02088 , G01B11/0608 , G01B11/2441 , G01B2210/56
摘要: A wafer metrology system includes an interferometer sub-system and a controller. The interferometer sub-system is configured to generate an interferogram with an intensity map that corresponds to a modulated representation of a wafer surface. Further, the interferometer sub-system includes a detector configured to capture the interferogram. The controller includes one or more processors configured to generate a wrapped phase map of the interferogram, define patterns associated with features on the wafer, and correct phase discontinuities by applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map and correcting phase discontinuities in the unwrapped phase map based on the patterns, or by combining phase unwrapping and correction in a unified step. Further, the patterns comprise two or more structures such that a portion of the unwrapped phase map associated with structures of the same type is continuous across borders separating structures of the same type.
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