公开(公告)号：US20230392257A1

公开(公告)日：2023-12-07

申请号：US18453584

申请日：2023-08-22

Applicant: Kokusai Electric Corporation

Inventor： Masaya NISHIDA ,  Tomohiko KADOSAKI ,  Fumie ANDO ,  Kenichi MAEDA ,  Yosuke KUWATA ,  Fumikazu TAKEUCHI

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  H01L21/02

CPC classification number: C23C16/4412 ,  C23C16/45561 ,  C23C16/52 ,  H01L21/0217 ,  H01L21/02271

Abstract: There is provided a technique that includes: a first gas supply line configured to supply a first gas to a substrate in a process chamber; a first exhaust line connected to a first pump and exhausting the first gas supplied to the substrate; a first valve installed at the first exhaust line; a second gas supply line configured to supply a second gas to the substrate in the process chamber; a second exhaust line connected to a second pump and exhausting the second gas supplied to the substrate; a second valve installed at the second exhaust line; and a controller capable of controlling the first valve and the second valve, so as to perform a first line change processing of exhausting the first gas supplied to the substrate toward the second pump via the second exhaust line, when determining that the first exhaust line transitioned into a predetermined state.

公开(公告)号：US20230144886A1

公开(公告)日：2023-05-11

申请号：US18072278

申请日：2022-11-30

Applicant: KOKUSAI ELECTRIC CORPORATION

Inventor： Masaya NISHIDA ,  Nobuhito SHIMA ,  Akihiro SATO ,  Yosuke KUWATA ,  Kenichi MAEDA

IPC: C23C16/44 ,  C23C16/34 ,  H01L21/02 ,  C23C16/52 ,  H01L21/66

CPC classification number: C23C16/4408 ,  C23C16/52 ,  C23C16/345 ,  H01L21/0217 ,  H01L21/0228 ,  H01L22/10

Abstract: There is provided a technique that includes executing a process recipe for processing a substrate; and executing a correction recipe for checking a characteristic value of a supply valve installed at a process gas supply line, wherein the act of executing the correction recipe comprises: supplying an inert gas into the process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of a process furnace and adjusts an internal pressure of the process furnace is fully opened; detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is fully opened; and calculating the characteristic value of the supply valve based on the detected pressure value.

公开(公告)号：US20220100176A1

公开(公告)日：2022-03-31

申请号：US17484183

申请日：2021-09-24

Applicant: KOKUSAI ELECTRIC CORPORATION

Inventor： Susumu NISHIURA ,  Kenichi MAEDA ,  Hiroyuki KITAMOTO ,  Hajime ABIKO

IPC: G05B19/418 ,  H01L21/66 ,  H01L21/677 ,  G01V1/00

Abstract: There is provided a configuration that includes: at least one transfer mechanism configured to transfer a substrate and at least one processing mechanism configured to process the substrate; an earthquake detector configured to detect an earthquake; and a controller configured to control the at least one transfer mechanism and the at least one processing mechanism according to a detection result of the earthquake detector, wherein the controller is configured to be capable of performing a stopping operation of the at least one transfer mechanism according to a P wave (initial tremor wave) and an S wave (principal fluctuation wave).

公开(公告)号：US20190390333A1

公开(公告)日：2019-12-26

申请号：US16451507

申请日：2019-06-25

Applicant: KOKUSAI ELECTRIC CORPORATION

Inventor： Masaya NISHIDA ,  Nobuhito SHIMA ,  Akihiro SATO ,  Yosuke KUWATA ,  Kenichi MAEDA

IPC: C23C16/44 ,  C23C16/34 ,  C23C16/52 ,  H01L21/02

Abstract: There is provided a technique that includes executing a process recipe for processing a substrate; and executing a correction recipe for checking a characteristic value of a supply valve installed at a process gas supply line, wherein the act of executing the correction recipe comprises: supplying an inert gas into the process gas supply line for a certain period of time in a state where an adjusting valve that is installed at an exhaust portion of a process furnace and adjusts an internal pressure of the process furnace is fully opened; detecting a pressure value in a supply pipe provided with the supply valve while supplying the inert gas into the process gas supply line in the state where the adjusting valve is fully opened; and calculating the characteristic value of the supply valve based on the detected pressure value.