公开(公告)号：US10745532B1

公开(公告)日：2020-08-18

申请号：US16697167

申请日：2019-11-26

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jeong Gon Son ,  Jinwoo Oh ,  Sang-Soo Lee ,  Heesuk Kim ,  Min Park ,  Jong Hyuk Park ,  Seungjun Chung ,  Tae Ann Kim

IPC: C08J5/18 ,  B32B27/28 ,  B32B27/30 ,  B82Y30/00 ,  B82Y40/00

Abstract: The present disclosure relates to a generalized method for producing a vertically oriented block copolymer film, a block copolymer film with controlled orientation obtained thereby, and a method for producing a self-assembled pattern. According to the present disclosure, it is possible to form a crosslinked layer, which is mechanically stable and undergoes no chemical change, by subjecting the block copolymer surface to plasma treatment using a filter. It is also possible to obtain a vertically oriented block copolymer film by annealing the block copolymer film having such a crosslinked layer. The method for producing a vertically oriented block copolymer film according to the present disclosure is advantageous in that it can be applied for general purpose regardless of the chemical structure, type and morphology of a block copolymer, and the method can be applied generally to the conventional directed self assembly process.