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公开(公告)号:US20200149152A1
公开(公告)日:2020-05-14
申请号:US16198663
申请日:2018-11-21
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Jaehyun PARK , Yumin SIM , Jaikyeong KIM
Abstract: A method for synthesizing a graphene pattern is provided. According to the method, a catalyst block including a catalyst material is physically adhered to a portion of a growth substrate to form an interface between the catalyst block and the growth substrate. A graphene thin film is formed selectively at the interface between the catalyst block and the growth substrate in an atmosphere including a carbon source and a growth inhibitor.