Laminated Microcapsule Sheet Producing Apparatus
    1.
    发明申请
    Laminated Microcapsule Sheet Producing Apparatus 审中-公开
    层压微胶囊片生产设备

    公开(公告)号:US20090188630A1

    公开(公告)日:2009-07-30

    申请号:US12162024

    申请日:2007-02-02

    IPC分类号: B65C11/02

    摘要: An apparatus capable of producing a laminated microcapsule sheet through transferring with high productivity of a drug solution of high viscosity accurately as much as a given weight while avoiding run-off from an enteric layer. There is provided an apparatus comprising edible film holding means (1) for holding an edible film (4); solution transfer printing means (2) equipped with multiple needles (22) for transfer printing of a solution containing any of materials; and a pallet (3) for applying of the solution containing any of materials to the solution transfer printing means (2).

    摘要翻译: 一种能够以高生产率的高粘度精确地转移高粘度的药物溶液,同时避免从肠溶层流出而能够产生层压微胶囊片的装置。 提供了一种包括用于保持可食用膜(4)的可食用膜保持装置(1)的装置; 溶液转移印刷装置(2),其配备有多个针(22),用于转印印刷含有任何材料的溶液; 以及用于将含有任何材料的溶液施加到溶液转印打印装置(2)的托盘(3)。

    Microcapsule Sheet
    2.
    发明申请
    Microcapsule Sheet 审中-公开
    微胶囊片

    公开(公告)号:US20100136123A1

    公开(公告)日:2010-06-03

    申请号:US12445250

    申请日:2007-10-12

    IPC分类号: A61K9/50

    CPC分类号: A61K9/5089 A61J3/07

    摘要: In order to heighten the density of microcapsules and facilitate handling by the unit composed of microcapsules in a given amount smaller than in the whole sheet, a microcapsule sheet which comprises a substrate constituted of an edible film and microcapsules each obtained by surrounding a core layer with a first shell film and a second shell film, the microcapsules being arranged according to a given pattern so as to be arranged only in those regions of the substrate which are separated from each other.

    摘要翻译: 为了提高微胶囊的密度,便于以比整个片材小的给定量的由微胶囊组成的单元处理,所述微胶囊片包括由可食用膜构成的基材和微胶囊,每个微胶囊通过围绕核心层与 第一壳膜和第二壳膜,根据给定的图案布置微胶囊,以便仅布置在彼此分离的基板的那些区域中。

    Substrate holder and exposure apparatus having the same
    3.
    发明授权
    Substrate holder and exposure apparatus having the same 有权
    基板支架和具有相同的曝光装置

    公开(公告)号:US07834982B2

    公开(公告)日:2010-11-16

    申请号:US11769035

    申请日:2007-06-27

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    IPC分类号: G03B27/58

    CPC分类号: G03F7/707 G03F7/70708

    摘要: A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.

    摘要翻译: 一种基板保持装置,包括用于吸引基板的第一表面的第一保持构件,与第二保持构件吸引第二表面的基板的与第一表面相对的第二表面接触的第二保持构件,以及 强制构件,用于迫使第一保持构件朝向第二保持构件。

    Exposure apparatus and aligning method
    4.
    发明授权
    Exposure apparatus and aligning method 有权
    曝光装置和对准方法

    公开(公告)号:US07298482B2

    公开(公告)日:2007-11-20

    申请号:US11133258

    申请日:2005-05-20

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    CPC分类号: G03F9/7011 G01B11/272

    摘要: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit. The first and second alignment systems and the transfer system are arranged such that the second mark on the substrate transferred on the second stage is positioned within a view of the second image sensing unit.

    摘要翻译: 一种用于对准衬底并使用对准的衬底进行曝光的曝光装置。 该装置包括具有第一级和第一图像感测单元的第一对准系统,用于使用第一图像感测单元检测第一标记在第一级上的基板上的位置,传送系统以将基板传送到 其中第一标记的位置已经被第一对准系统从第一阶段检测到第二阶段,第二对准系统具有第二阶段和第二图像感测单元,其放大率高于 第一图像感测单元,使用第二图像感测单元来检测第二平台上的基板上的第二标记的位置,并且基于通过使用第二图像感测单元获得的检测来对准基板。 第一和第二对准系统和传送系统被布置成使得在第二台上传送的基板上的第二标记位于第二图像感测单元的视图内。

    Exposure apparatus and aligning method
    5.
    发明申请
    Exposure apparatus and aligning method 有权
    曝光装置和对准方法

    公开(公告)号:US20050219533A1

    公开(公告)日:2005-10-06

    申请号:US11133258

    申请日:2005-05-20

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    CPC分类号: G03F9/7011 G01B11/272

    摘要: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit. The first and second alignment systems and the transfer system are arranged such that the second mark on the substrate transferred on the second stage is positioned within a view of the second image sensing unit.

    摘要翻译: 一种用于对准衬底并使用对准的衬底进行曝光的曝光装置。 该装置包括具有第一级和第一图像感测单元的第一对准系统,用于使用第一图像感测单元检测第一标记在第一级上的基板上的位置,传送系统以将基板传送到 其中第一标记的位置已经被第一对准系统从第一阶段检测到第二阶段,第二对准系统具有第二阶段和第二图像感测单元,其放大率高于 第一图像感测单元,使用第二图像感测单元来检测第二平台上的基板上的第二标记的位置,并且基于通过使用第二图像感测单元获得的检测来对准基板。 第一和第二对准系统和传送系统被布置成使得在第二台上传送的基板上的第二标记位于第二图像感测单元的视图内。

    Exposure apparatus and aligning method

    公开(公告)号:US06952262B2

    公开(公告)日:2005-10-04

    申请号:US10762372

    申请日:2004-01-23

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    CPC分类号: G03F9/7011 G01B11/272

    摘要: An exposure apparatus for aligning a substrate and performing exposure using the aligned substrate. The apparatus includes a first alignment system, having a first stage and a first image sensing unit, to detect a position of a first mark on the substrate on the first stage using the first image sensing unit, a transfer system to transfer the substrate, on which the position of the first mark has been detected by the first alignment system, from the first stage onto a second stage, and a second alignment system, having the second stage and a second image sensing unit of which magnification is higher than that of the first image sensing unit, to detect a position of a second mark on the substrate on the second stage using the second image sensing unit, and to align the substrate based on the detection obtained by using the second image sensing unit. The first and second alignment systems and the transfer system are arranged such that the second mark on the substrate transferred on the second stage is positioned within a view of the second image sensing unit.

    Substrate holder and exposure apparatus having the same
    7.
    发明授权
    Substrate holder and exposure apparatus having the same 有权
    基板支架和具有相同的曝光装置

    公开(公告)号:US07295287B2

    公开(公告)日:2007-11-13

    申请号:US10972497

    申请日:2004-10-26

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    IPC分类号: G03B27/58 G03B27/62

    CPC分类号: G03F7/707 G03F7/70708

    摘要: A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.

    摘要翻译: 一种基板保持装置,包括用于吸引基板的第一表面的第一保持构件,与第二保持构件吸引第二表面的基板的与第一表面相对的第二表面接触的第二保持构件,以及 强制构件,用于迫使第一保持构件朝向第二保持构件。

    Substrate holder and exposure apparatus having the same
    8.
    发明申请
    Substrate holder and exposure apparatus having the same 有权
    基板支架和具有相同的曝光装置

    公开(公告)号:US20050094126A1

    公开(公告)日:2005-05-05

    申请号:US10972497

    申请日:2004-10-26

    申请人: Kiyohito Yamamoto

    发明人: Kiyohito Yamamoto

    CPC分类号: G03F7/707 G03F7/70708

    摘要: A substrate holding apparatus includes a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate; and a forcing member for forcing the first holding member toward said second holding member.

    摘要翻译: 基板保持装置包括用于吸引基板的第一表面的第一保持构件,与基板的与第一表面相对的第二表面接触的第二保持构件; 以及用于迫使所述第一保持构件朝向所述第二保持构件的强制构件。