公开(公告)号：US20240353353A1

公开(公告)日：2024-10-24

申请号：US18682988

申请日：2022-08-17

申请人： Karim S. KARIM ,  Abdollah PIL-ALI

发明人： Karim S. KARIM ,  Abdollah PIL-ALI

IPC分类号： G01N23/041 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G21K1/06

CPC分类号： G01N23/041 ,  G03F7/0035 ,  G03F7/2022 ,  G03F9/7003 ,  G21K1/062

摘要： The disclosure is directed at a multi-layer, high-aspect ratio X-ray grating apparatus and method of fabrication. In one embodiment, the disclosure may include a self-alignment methodology, or process, combined with a multiple layer structure fabrication. The grating may include a substrate with a seed layer on top. The grating further includes at least one patterned non-X-ray absorbing layer and at least one X-ray absorbing layer atop the seed layer.