Apparatus and method of backside anneal for reduced topside pattern effect
    1.
    发明申请
    Apparatus and method of backside anneal for reduced topside pattern effect 审中-公开
    背面退火的装置和方法减少顶面图案效应

    公开(公告)号:US20080076226A1

    公开(公告)日:2008-03-27

    申请号:US11525770

    申请日:2006-09-22

    IPC分类号: H01L21/336

    CPC分类号: H01L21/268

    摘要: Embodiments of an apparatus and methods for heating an absorbing layer on a wafer by exposing the wafer to an electromagnetic energy source are generally described herein. Other embodiments may be described and claimed.

    摘要翻译: 这里通常描述通过将晶片暴露于电磁能源来加热晶片上的吸收层的装置和方法的实施例。 可以描述和要求保护其他实施例。

    Multi-zone reflecting device for use in flash lamp processes
    2.
    发明授权
    Multi-zone reflecting device for use in flash lamp processes 失效
    用于闪光灯工艺的多区域反射装置

    公开(公告)号:US07109443B2

    公开(公告)日:2006-09-19

    申请号:US10815068

    申请日:2004-03-26

    IPC分类号: F27B5/14

    CPC分类号: H01L21/67115 F27B17/0025

    摘要: A method, apparatus, and system including a reflecting device having a plurality of reflecting zones with associated reflectivities for reflecting light from a flash lamp, are described herein.

    摘要翻译: 本文描述了一种包括具有多个反射区域的反射装置的方法,装置和系统,其具有用于反射来自闪光灯的光的相关联的反射率。