RECEIVING APPARATUS AND RECEIVING METHOD
    3.
    发明申请
    RECEIVING APPARATUS AND RECEIVING METHOD 失效
    接收装置和接收方法

    公开(公告)号:US20090232135A1

    公开(公告)日:2009-09-17

    申请号:US12401660

    申请日:2009-03-11

    IPC分类号: H04L12/56

    摘要: A receiving unit receives a group of packets transmitted from a transmitting apparatus. A detecting unit detects a missing packet based on the received group of packets. A first output unit outputs data corresponding to the group of packets, irrespective of a result of the detection by the detecting unit. A transmitting unit transmits a retransmission request for the missing packet to the transmitting apparatus. A re-receiving unit receives the missing packet retransmitted from the transmitting apparatus in response to the retransmission request. A second output unit outputs data corresponding to the group of packets and the retransmitted packet.

    摘要翻译: 接收单元接收从发送装置发送的一组分组。 检测单元基于所接收的分组组来检测丢失的分组。 无论检测单元的检测结果如何,第一输出单元输出与该组分组相对应的数据。 发送单元向发送装置发送丢失分组的重发请求。 再接收单元响应于重发请求,从发送装置接收丢失的分组。 第二输出单元输出与分组组和重传分组相对应的数据。

    Receiving apparatus and receiving method
    4.
    发明授权
    Receiving apparatus and receiving method 失效
    接收装置和接收方法

    公开(公告)号:US07852847B2

    公开(公告)日:2010-12-14

    申请号:US12401660

    申请日:2009-03-11

    IPC分类号: H04L12/28

    摘要: A receiving unit receives a group of packets transmitted from a transmitting apparatus. A detecting unit detects a missing packet based on the received group of packets. A first output unit outputs data corresponding to the group of packets, irrespective of a result of the detection by the detecting unit. A transmitting unit transmits a retransmission request for the missing packet to the transmitting apparatus. A re-receiving unit receives the missing packet retransmitted from the transmitting apparatus in response to the retransmission request. A second output unit outputs data corresponding to the group of packets and the retransmitted packet.

    摘要翻译: 接收单元接收从发送装置发送的一组分组。 检测单元基于所接收的分组组来检测丢失的分组。 无论检测单元的检测结果如何,第一输出单元输出与该组分组相对应的数据。 发送单元向发送装置发送丢失分组的重发请求。 再接收单元响应于重发请求,从发送装置接收丢失的分组。 第二输出单元输出与分组组和重传分组相对应的数据。

    Image monitor apparatus controlling camera and illumination in order to optimize luminance of picked-up image
    5.
    发明授权
    Image monitor apparatus controlling camera and illumination in order to optimize luminance of picked-up image 失效
    控制摄像机和照明的图像监视器装置,以便优化拾取图像的亮度

    公开(公告)号:US07202902B2

    公开(公告)日:2007-04-10

    申请号:US09821439

    申请日:2001-03-29

    IPC分类号: H04N5/222 H04N5/235 G03B7/00

    CPC分类号: H04N5/2354

    摘要: In an image monitor apparatus for monitoring an image: a camera picks up an image; an emission control unit controls at least one light emitting element; an image signal acquiring unit performs analog-to-digital conversion of the image picked up by the camera so as to generate a digitized image signal, and stores the digitized image signal; a luminance examining unit examines luminance of the image represented by the digitized image signal, and determines whether or not the amount of light detected and stored in an image-pickup plane of the camera is appropriate; and a luminance control unit controls at least one of the camera and the luminance control unit so that the amount of light stored in an image-pickup plane becomes appropriate.

    摘要翻译: 在用于监视图像的图像监视装置中:相机拾取图像; 排放控制单元控制至少一个发光元件; 图像信号获取单元执行由照相机拍摄的图像的模数转换,以产生数字化图像信号,并存储数字化的图像信号; 亮度检查单元检查由数字化图像信号表示的图像的亮度,并且确定在相机的图像拾取平面中检测和存储的光量是否合适; 并且亮度控制单元控制相机和亮度控制单元中的至少一个,使得存储在图像拾取平面中的光量变得适当。

    Electron beam exposure mask and electron beam exposure method using the same
    6.
    发明授权
    Electron beam exposure mask and electron beam exposure method using the same 失效
    电子束曝光掩模和使用其的电子束曝光方法

    公开(公告)号:US06972165B2

    公开(公告)日:2005-12-06

    申请号:US10343228

    申请日:2002-05-30

    申请人: Ichiro Kagami

    发明人: Ichiro Kagami

    摘要: An electron beam exposure mask which makes it possible to reduce the number of times of exchange and to shorten the exposure time, is disclosed. The electron beam exposure mask (10) comprises at least two each of one or at least two kinds of exposure regions, for example, three kinds of exposure regions consisting of hole layer exposure regions (A), wiring layer exposure regions (B), and gate layer exposure regions (C). By this, at the time of conducting exposure by use of each exposure region, it suffices to move the exposure region to a predetermined exposure position, and it is unnecessary to exchange the electron beam exposure mask (10) by taking it out of the electron beam exposure device. Further, since at least two each of each kind of exposure regions are provided, an exposure region stained during use can be substituted with another exposure region, so that the number of times of cleaning of the electron beam exposure mask (10) is reduced, and the number of times of exchange of the electron beam exposure mask (10) can be reduced. Therefore, the exposure time in a lithography step can be shortened.

    摘要翻译: 公开了一种能够减少交换次数并缩短曝光时间的电子束曝光掩模。 电子束曝光掩模(10)包括一个或至少两种曝光区域中的至少两个曝光区域,例如由空穴层曝光区域(A),布线层曝光区域(B), 和栅极层曝光区域(C)。 这样,在通过使用每个曝光区域进行曝光时,将曝光区域移动到预定的曝光位置就足够了,不需要将电子束曝光掩模(10)从电子中取出 光束曝光装置。 此外,由于设置了各种曝光区域中的至少两个,所以在使用期间染色的曝光区域可以用另一个曝光区域代替,使得电子束曝光掩模(10)的清洁次数减少, 并且可以减少电子束曝光掩模(10)的交换次数。 因此,可以缩短光刻步骤中的曝光时间。