摘要:
A method is disclosed for setting a master node of a ring network that has adjacently connected nodes situated on rightward and leftward lines of a bidirectional transmission channel. The method includes the steps of: counting the number of nodes interposed between a designated node and each node other than the designated node on the rightward and leftward lines of the bidirectional transmission channel; and setting one of the nodes as the master node. The master node satisfies a relation of, NHC_L=NHC_R or NHC_L=NHC_R-1, wherein NHC_L is the number of interposed nodes counted from the leftward line, and NHC_R is the number of interposed nodes counted from the rightward line.
摘要:
A method is disclosed for setting a master node of a ring network that has adjacently connected nodes situated on rightward and leftward lines of a bidirectional transmission channel. The method includes the steps of: counting the number of nodes interposed between a designated node and each node other than the designated node on the rightward and leftward lines of the bidirectional transmission channel; and setting one of the nodes as the master node. The master node satisfies a relation of, NHC_L=NHC_R or NHC_L=NHC_R-1, wherein NHC_L is the number of interposed nodes counted from the leftward line, and NHC_R is the number of interposed nodes counted from the rightward line.
摘要:
A receiving unit receives a group of packets transmitted from a transmitting apparatus. A detecting unit detects a missing packet based on the received group of packets. A first output unit outputs data corresponding to the group of packets, irrespective of a result of the detection by the detecting unit. A transmitting unit transmits a retransmission request for the missing packet to the transmitting apparatus. A re-receiving unit receives the missing packet retransmitted from the transmitting apparatus in response to the retransmission request. A second output unit outputs data corresponding to the group of packets and the retransmitted packet.
摘要:
A receiving unit receives a group of packets transmitted from a transmitting apparatus. A detecting unit detects a missing packet based on the received group of packets. A first output unit outputs data corresponding to the group of packets, irrespective of a result of the detection by the detecting unit. A transmitting unit transmits a retransmission request for the missing packet to the transmitting apparatus. A re-receiving unit receives the missing packet retransmitted from the transmitting apparatus in response to the retransmission request. A second output unit outputs data corresponding to the group of packets and the retransmitted packet.
摘要:
In an image monitor apparatus for monitoring an image: a camera picks up an image; an emission control unit controls at least one light emitting element; an image signal acquiring unit performs analog-to-digital conversion of the image picked up by the camera so as to generate a digitized image signal, and stores the digitized image signal; a luminance examining unit examines luminance of the image represented by the digitized image signal, and determines whether or not the amount of light detected and stored in an image-pickup plane of the camera is appropriate; and a luminance control unit controls at least one of the camera and the luminance control unit so that the amount of light stored in an image-pickup plane becomes appropriate.
摘要:
An electron beam exposure mask which makes it possible to reduce the number of times of exchange and to shorten the exposure time, is disclosed. The electron beam exposure mask (10) comprises at least two each of one or at least two kinds of exposure regions, for example, three kinds of exposure regions consisting of hole layer exposure regions (A), wiring layer exposure regions (B), and gate layer exposure regions (C). By this, at the time of conducting exposure by use of each exposure region, it suffices to move the exposure region to a predetermined exposure position, and it is unnecessary to exchange the electron beam exposure mask (10) by taking it out of the electron beam exposure device. Further, since at least two each of each kind of exposure regions are provided, an exposure region stained during use can be substituted with another exposure region, so that the number of times of cleaning of the electron beam exposure mask (10) is reduced, and the number of times of exchange of the electron beam exposure mask (10) can be reduced. Therefore, the exposure time in a lithography step can be shortened.