摘要:
In a method for exposing a photosensitive resist layer with near-field light, a liquid film layer is provided between the photosensitive resist layer and a photomask. The photomask has a light-shielding film containing an opening portion through which a propagated light emitted from a light source cannot pass. The photosensitive resist layer is exposed with near-field light through the opening portion and the liquid film layer.
摘要:
An optical device includes a first waveguide layer in which multiple-beam interference occurs, a second waveguide layer which includes a back surface facing the first waveguide layer and a front surface as a light output surface, and a diffraction grating which is arranged on a back side of the second waveguide layer and faces the first waveguide layer, wherein a grating constant of the diffraction grating is defined such that a first-order diffracted light emerges from the second waveguide layer, the first-order diffracted light being generated when a light component having a highest intensity of light which propagates in an in-plane direction while causing multiple reflection in the first waveguide layer enters the diffraction grating.
摘要:
An optical device includes a first waveguide layer in which multiple-beam interference occurs, a second waveguide layer which includes a back surface facing the first waveguide layer and a front surface as a light output surface, and a diffraction grating which is arranged on a back side of the second waveguide layer and faces the first waveguide layer, wherein a grating constant of the diffraction grating is defined such that a first-order diffracted light emerges from the second waveguide layer, the first-order diffracted light being generated when a light component having a highest intensity of light which propagates in an in-plane direction while causing multiple reflection in the first waveguide layer enters the diffraction grating.
摘要:
In a method for exposing a photosensitive resist layer with near-field light, a liquid film layer is provided between the photosensitive resist layer and a photomask. The photomask has a light-shielding film containing an opening portion whose width is smaller than the wavelength of light emitted from a light source. The photosensitive resist layer is exposed with near-field light through the opening portion and the liquid film layer.
摘要:
Disclosed is an organic electroluminescent element, comprising an anode and a cathode, an organic light-emitting layer interposed between the anode and the cathode, and an organic hole transfer layer containing a polymer type organic hole transfer material having a metal oxide of a semiconductor material or a conductive material added thereto.
摘要:
Disclosed is an organic electroluminescent element, comprising an anode and a cathode, an organic light-emitting layer interposed between the anode and the cathode, and an organic hole transfer layer containing a polymer type organic hole transfer material having a metal oxide of a semiconductor material or a conductive material added thereto.
摘要:
An electroluminescent display has a transparent substrate. A transparent positive electrode is formed on the transparent substrate. An inert metal film is formed on the transparent positive electrode. A hole transport layer on the inert metal film, includes a conductive polymer doped with a polymeric electrolyte containing a sulfone group. An emissive layer is formed on the hole transport layer.
摘要:
An electroluminescent display has a transparent substrate. A transparent positive electrode is formed on the transparent substrate. An inert metal film is formed on the transparent positive electrode. A hole transport layer on the inert metal film, includes a conductive polymer doped with a polymeric electrolyte containing a sulfone group. An emissive layer is formed on the hole transport layer.